Nd:YAG pulsed laser deposition of AlVO4 thin films on alumina and monocrystalline MgO (Articolo in rivista)

Type
Label
  • Nd:YAG pulsed laser deposition of AlVO4 thin films on alumina and monocrystalline MgO (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.matlet.2005.05.012 (literal)
Alternative label
  • R. Castro-Rodríguez, J.L. Peña, O. Arés, F. Leccabue, B.E. Watts, E. Melioli (2005)
    Nd:YAG pulsed laser deposition of AlVO4 thin films on alumina and monocrystalline MgO
    in Materials letters (Gen. ed.); ELSEVIER SCIENCE BV, PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS, AMSTERDAM (Paesi Bassi)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • R. Castro-Rodríguez, J.L. Peña, O. Arés, F. Leccabue, B.E. Watts, E. Melioli (literal)
Pagina inizio
  • 3027 (literal)
Pagina fine
  • 3032 (literal)
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  • 59 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 24-25 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1 CINVESTAV, IPN, Dept Appl Phys, Merida 97310, Yuc, Mexico; 2 Univ La Habana, Fac Phys, IMRE, Superconduct Lab, Havana 10400, Cuba; 3 CNR, Ist IMEM, I-43100 Parma, Italy (literal)
Titolo
  • Nd:YAG pulsed laser deposition of AlVO4 thin films on alumina and monocrystalline MgO (literal)
Abstract
  • AlVO4 thin films were prepared by infrared Nd:YAG pulsed laser deposition on two different substrates (polycrystalline Al2O3 and monocrystalline MgO). The distance between the target-substrate (30 mm) and the partial oxygen pressure (0.14 mbar) during the deposition process were chosen taking into account the previous experiences with other oxides. The substrate temperature was varied between 300 and 600 -C finding an optimum at about 400 -C. At higher temperatures, the vanadium seems to evaporate from substrate surface with a strong change of stoichiometry. Preferential growth of AlVO4 films in the direction (022), were grown on MgO substrates. A very high sensitivity of these films to a flux of NO2 gas is also shown. (literal)
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