Evaluation of tetra-alkylchromium precursors for organometallic chemical vapour deposition I. films grown using Cr[CH2C(CH3)3]4 (Articolo in rivista)

Type
Label
  • Evaluation of tetra-alkylchromium precursors for organometallic chemical vapour deposition I. films grown using Cr[CH2C(CH3)3]4 (Articolo in rivista) (literal)
Anno
  • 1992-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/0040-6090(92)90106-L (literal)
Alternative label
  • Maury F.; Ossola F. (1992)
    Evaluation of tetra-alkylchromium precursors for organometallic chemical vapour deposition I. films grown using Cr[CH2C(CH3)3]4
    in Thin solid films (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Maury F.; Ossola F. (literal)
Pagina inizio
  • 82 (literal)
Pagina fine
  • 89 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://www.sciencedirect.com/science/article/pii/004060909290106L (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 207 (literal)
Rivista
Note
  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Laboratoire de Cristallochimie, Réactivité et Protection des Matériaux, URA CNRS 445, 118 Route de Narbonne, F-31077 Toulouse Cedex, France / Instituto di Chimica e Tecnologia dei Radioelementi, CNR, Corso Stati Uniti 4, I-35100 Padua, Italy (literal)
Titolo
  • Evaluation of tetra-alkylchromium precursors for organometallic chemical vapour deposition I. films grown using Cr[CH2C(CH3)3]4 (literal)
Abstract
  • Chromium carbide thin films have been deposited by organometallic chemical vapour deposition using the ?-alkylchromium complex Cr[CH2C(CH3)3]4. The growth was achieved in a hot wall, low pressure chemical vapour deposition reactor in the temperature range 250-350 °C under an inert or hydrogen atmosphere. As a result of the high reactivity of this precursor towards oxygen, the films were partially oxidized. Oxygen incorporation decreases on increasing the deposition temperature. Characterization of their heterogenous structure, mainly by electron diffraction and X-ray photoelectron spectroscopy, gives evidence, in spite of a poor crystallinity, for a mixture of cubic chromium carbide CrC1-x phase, amorphous chromium metal, chromium oxides (mainly Cr2O3) and free carbon, whose proportions depend on the deposition conditions. (literal)
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