Using UV-based Nanoimprint Lithography to Fabricate Single and Multilayer negative Index Materials (Abstract/Comunicazione in atti di convegno)

Type
Label
  • Using UV-based Nanoimprint Lithography to Fabricate Single and Multilayer negative Index Materials (Abstract/Comunicazione in atti di convegno) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Alternative label
  • I. Bergmair, B. Dastmalchi, M. Bergmair, G. Hesser, M. Losurdo, G. Bruno, C. Helgert, E. Pshenay-Severin, T. Pertsch, E.B. Kley, U. Huebner, R. Penciu, N. H. Shen, M. Kafesaki, C.M. Soukoulis, K. Hingerl, M. Muehlberger (2012)
    Using UV-based Nanoimprint Lithography to Fabricate Single and Multilayer negative Index Materials
    in 28th European Mask and Lithography Conference, Dresden, Germany, January 17 - 18, 2012
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • I. Bergmair, B. Dastmalchi, M. Bergmair, G. Hesser, M. Losurdo, G. Bruno, C. Helgert, E. Pshenay-Severin, T. Pertsch, E.B. Kley, U. Huebner, R. Penciu, N. H. Shen, M. Kafesaki, C.M. Soukoulis, K. Hingerl, M. Muehlberger (literal)
Note
  • Abstract (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • IMIP-CNR, Italy Profactor GmbH, Austria Linz University, Austria jena University, Germany FORTH, Greece (literal)
Titolo
  • Using UV-based Nanoimprint Lithography to Fabricate Single and Multilayer negative Index Materials (literal)
Prodotto di
Autore CNR

Incoming links:


Prodotto
Autore CNR di
data.CNR.it