UV-based nanoimprint lithography: a method to fabricate single and multilayer negative index materials (Abstract/Comunicazione in atti di convegno)

Type
Label
  • UV-based nanoimprint lithography: a method to fabricate single and multilayer negative index materials (Abstract/Comunicazione in atti di convegno) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Alternative label
  • I. Bergmair, B. Dastmalchi, M. Bergmair, G. Hesser, M. Losurdo, G. Bruno, Helgert, E. Pshenay-Severin, E.B. Kley, U. Huebner, N. H. Shen, M. Kafesaki, C.M. Soukoulis, K. Hingerl, M. Muehlberg (2012)
    UV-based nanoimprint lithography: a method to fabricate single and multilayer negative index materials
    in SPIE Photonics Europe 2012: Photonics, Optics, Lasers, Micro- Nanotechnologies Research, Brussels, Belgium, 16 - 19 April 2012
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • I. Bergmair, B. Dastmalchi, M. Bergmair, G. Hesser, M. Losurdo, G. Bruno, Helgert, E. Pshenay-Severin, E.B. Kley, U. Huebner, N. H. Shen, M. Kafesaki, C.M. Soukoulis, K. Hingerl, M. Muehlberg (literal)
Note
  • Abstract (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR-IMIP, Italy Profactor GmbH, Austria Linz University, Austria Jena University, Germany FORTH, Greece (literal)
Titolo
  • UV-based nanoimprint lithography: a method to fabricate single and multilayer negative index materials (literal)
Prodotto di
Autore CNR

Incoming links:


Prodotto
Autore CNR di
data.CNR.it