Fabrication of Negative Index Materials in the Visible Regime Using Nanoimprint Lithography (Abstract/Comunicazione in atti di convegno)

Type
Label
  • Fabrication of Negative Index Materials in the Visible Regime Using Nanoimprint Lithography (Abstract/Comunicazione in atti di convegno) (literal)
Anno
  • 2012-01-01T00:00:00+01:00 (literal)
Alternative label
  • I. Bergmair, A. Rank, B. Dastmalchi, S. Tollabimazraehno, K. hingerl, H. Piglmayer-Brezina, T.A. Klar, M. Losurdo, G. Bruno, C. Helgert, E. Pshenay-Severin, M. Falkner, T. Pertsch, E.B. Kley, M.A. Verschuuren, U. Huebner, N. H. Shen, M. Kafesaki, C.M. Soukoulis, M. Muehlberger (2012)
    Fabrication of Negative Index Materials in the Visible Regime Using Nanoimprint Lithography
    in PECS-X: 10th International Symposium on Photonic and Electromagnetic Crystal Structures, Santa Fe, Mexico, June3-8, 2012
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • I. Bergmair, A. Rank, B. Dastmalchi, S. Tollabimazraehno, K. hingerl, H. Piglmayer-Brezina, T.A. Klar, M. Losurdo, G. Bruno, C. Helgert, E. Pshenay-Severin, M. Falkner, T. Pertsch, E.B. Kley, M.A. Verschuuren, U. Huebner, N. H. Shen, M. Kafesaki, C.M. Soukoulis, M. Muehlberger (literal)
Note
  • Abstract (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • IMIP-CNR Profactor GmbH Jena University Philips FORTH, Greece (literal)
Titolo
  • Fabrication of Negative Index Materials in the Visible Regime Using Nanoimprint Lithography (literal)
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