Effective screening and the plasmaron bands in graphene (Articolo in rivista)

Type
Label
  • Effective screening and the plasmaron bands in graphene (Articolo in rivista) (literal)
Anno
  • 2011-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1103/PhysRevB.84.085410 (literal)
Alternative label
  • A.L. Walter, A. Bostwick, K.-J. Jeon, F. Speck, M. Ostler, T. Seyller, L. Moreschini, Y.J. Chang, M. Polini, R. Asgari, A.H. MacDonald, K. Horn, and E. Rotenberg (2011)
    Effective screening and the plasmaron bands in graphene
    in Physical review. B, Condensed matter and materials physics
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • A.L. Walter, A. Bostwick, K.-J. Jeon, F. Speck, M. Ostler, T. Seyller, L. Moreschini, Y.J. Chang, M. Polini, R. Asgari, A.H. MacDonald, K. Horn, and E. Rotenberg (literal)
Pagina inizio
  • 085410 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://link.aps.org/doi/10.1103/PhysRevB.84.085410 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 84 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Advanced Light Source (ALS), E. O. Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA Department of Molecular Physics, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin, Germany School of Electrical Engineering, University of Ulsan, Namgu, Ulsan, 680-749, South Korea Lehrstuhl für Technische Physik, Universität Erlangen-Nürnberg, Erwin-Rommel-Strasse 1, D-91058 Erlangen, Germany NEST, Istituto Nanoscienze-CNR and Scuola Normale Superiore, I-56126 Pisa, Italy School of Physics, Institute for Research in Fundamental Sciences (IPM), Tehran 19395-5531, Iran Department of Physics, University of Texas at Austin, 1 University Station C1600, Austin, Texas 78712, USA (literal)
Titolo
  • Effective screening and the plasmaron bands in graphene (literal)
Abstract
  • Electron-plasmon coupling in graphene has been shown recently to give rise to a \"plasmaron\" quasiparticle excitation. The strength of this coupling has been predicted to depend on the effective screening, which in turn is expected to depend on the dielectric environment of the graphene sheet. Here we compare the strength of environmental screening for graphene on four different substrates by evaluating the separation of the plasmaron bands from the hole bands using angle-resolved photoemission spectroscopy. Comparison with G0W-random phase approximation predictions are used to determine the effective dielectric constant of the underlying substrate layer. We also show that plasmaron and electronic properties of graphene can be independently manipulated, an important aspect of a possible use in \"plasmaronic\" devices. (literal)
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