http://www.cnr.it/ontology/cnr/individuo/prodotto/ID191758
Deposition of Boron-carbon multilayer coatings by RF plasma sputtering (Articolo in rivista)
- Type
- Label
- Deposition of Boron-carbon multilayer coatings by RF plasma sputtering (Articolo in rivista) (literal)
- Anno
- 2013-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.surfcoat.2012.11.001 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Vassallo E.; Caniello R.; Cremona A.; Croci G.; Dellasega D.; Gorini G.; Grosso G.; Miorin E.; Passoni M.; Tardocchi M. (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
- http://www.sciencedirect.com/science/article/pii/S025789721201119X (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Scopu (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- 1-5,7,9,10 : CNR, Istituto di Fisica del Plasma P.Caldirola, Italy /
6 : Università degli Studi di Milano-Bicocca, Dipartimento di Fisica, Italy /
5,9 : Politecnico di Milano, Dipartimento di Energia, Italy /
8 : CNR, Istituto per l'Energetica e le Interfasi, Padova, Italy (literal)
- Titolo
- Deposition of Boron-carbon multilayer coatings by RF plasma sputtering (literal)
- Abstract
- Boron-carbon coatings are typically accomplished by ion-assisted methods that generate energetic species of
tens to hundreds of electron volt to facilitate the nucleation and growth processes. These energetic particles
simultaneously induce a significant intrinsic stress leading to the film delamination, limiting the achievable
thickness of the films to approximately a few hundred nanometers and creating difficulties for their technical
applications. In this paper we propose a plasma method using an RF (13.56 MHz) capacitive system as a
deposition technique to realize B-C coatings with a low residual intrinsic stress. A stable coating has been
obtained by deposition of a multilayered structure in conditions of very low deposition rate. SEM micrographs
show that the layers making up the coating are dense, without pores or cracks, and with a good
adhesion to the substrates. (literal)
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