Comparison of Photooxidation and Thermal Oxidation Processes in Poly(ether imide) (Articolo in rivista)

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Label
  • Comparison of Photooxidation and Thermal Oxidation Processes in Poly(ether imide) (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1021/ma0502351 (literal)
Alternative label
  • S.Carroccio; C.Puglisi; G.Montaudo (2005)
    Comparison of Photooxidation and Thermal Oxidation Processes in Poly(ether imide)
    in Macromolecules (Print); ACS, American chemical society, Washington, DC (Stati Uniti d'America)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • S.Carroccio; C.Puglisi; G.Montaudo (literal)
Pagina inizio
  • 6863 (literal)
Pagina fine
  • 6870 (literal)
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  • Citazione=5, Motore utilizzato per le citazioni=Isiwebofknowledge.com (literal)
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  • 38 (literal)
Rivista
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  • No. Citazione=2; Autocitazione=1; Motore utilizzato per le citazioni=Isiwebofknowledge.com (literal)
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  • 8 (literal)
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  • 16 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, ICTP, Catania Università di Catania (literal)
Titolo
  • Comparison of Photooxidation and Thermal Oxidation Processes in Poly(ether imide) (literal)
Abstract
  • Thermal oxidn. and photooxidn. processes occurring in poly 2,2-bis[4-(3,4-dicarboxyphenoxy)phenyl]propane dianhydride-1,3-phenylendiamine copolymer (ULTEM), were investigated and compared. The study aimed at finding possible differences in the oxidn. pathways of this complex polymer by using the anal. power of MALDI techniques. ULTEM films were subjected to photooxidn. by exposure at 60 °C in a UV accelerated chamber (Q-UV Panel) in atm. air, and the oxidative process was followed as a function of the exposure time. Relevant structural information on the photooxidized ULTEM species was extd. from the MALDI spectra. These data show the presence of polymer chains contg. acetophenone, Ph acetic acid, phenols, benzoic acid, phthalic anhydride, and phthalic acid end groups. The mechanisms accounting for the formation of photooxidn. products of Ultem involve several reactions: (i) photocleavage of Me groups of the N-Me phthalimide terminal units; (ii) photooxidative degrdn. of the isopropylidene bridge of BPA units; (iii) photooxidn. of phthalimide units to phthalic anhydride and phthalic acid end groups. Some of these cleavage pathways are specific for the photooxidn. process and the oligomers deriving from them are absent in the thermal by oxidized Ultem samples, whereas the thermal cleavage of the di-Ph ether units appears to occur only in the thermal oxidn. process. (literal)
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