Structural investigation of photonic materials at the nanolevel using XPS (Articolo in rivista)

Type
Label
  • Structural investigation of photonic materials at the nanolevel using XPS (Articolo in rivista) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.jnoncrysol.2008.11.042 (literal)
Alternative label
  • G. Speranza, L. Minati, A. Chiasera, A. Chiappini, Y. Jestin, M. Ferrari, G.C. Righini (2009)
    Structural investigation of photonic materials at the nanolevel using XPS
    in Journal of non-crystalline solids
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • G. Speranza, L. Minati, A. Chiasera, A. Chiappini, Y. Jestin, M. Ferrari, G.C. Righini (literal)
Pagina inizio
  • 1157 (literal)
Pagina fine
  • 1159 (literal)
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  • 355 (literal)
Rivista
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  • doi:10.1016/j.jnoncrysol.2008.11.042 (literal)
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  • 3 (literal)
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  • 18-21 (literal)
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  • Pubblicazione su rivista ISI-JCR (literal)
Note
  • ISI Web of Science (WOS) (literal)
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • G. Speranza and L. Minati are at FBK-IRST via Sommarive 18, 38050 Povo, Italy A. Chiasera, A. Chiappini, Y. Jestin, and M. Ferrari are at CNR-IFN, CSMFO group, Via alla Cascata, 56/C, 38050 Povo-Trento, Italy G.C. Righini is at CNR, Department of Materials and Devices, via dei Taurini 19, 00185 Roma, Italy and MDF Lab., Nello Carrara Institute of Applied Physics, IFAC – CNR, Via Madonna del Piano 10, 50019 Sesto Fiorentino (Firenze), Italy (literal)
Titolo
  • Structural investigation of photonic materials at the nanolevel using XPS (literal)
Abstract
  • This work deals with X-ray photoemitted spectra (XPS) from materials which are of interest for photonic applications. In particular x HfO2 - (100 - x) SiO2 (x = 10, 20, 30 mol%) glass–ceramics planar waveguides and silver ion-exchanged (0.5, 1.5, 5 mol%) sodalime glasses are investigated. The aim of the work is to explore the material structural changes occurring at the nanometric scale which are produced during the fabrication process in order to enlighten the formation of the nanostructures. The results show that XPS is sufficiently sensitive to detect the formation of nanostructures in the analyzed materials providing at the same time also chemical information. Both these inputs are important to tune the production processes to increase the efficiency of the optical devices. (literal)
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