Characterization of a highly photorefractive RF-sputtered SiO2-GeO2 waveguide (Articolo in rivista)

Type
Label
  • Characterization of a highly photorefractive RF-sputtered SiO2-GeO2 waveguide (Articolo in rivista) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1364/OPEX.13.001696 (literal)
Alternative label
  • S. Sebastiani; G. Nunzi Conti; S. Pelli; G. C. Righini; A. Chiasera; M. Ferrari; C. Tosello (2005)
    Characterization of a highly photorefractive RF-sputtered SiO2-GeO2 waveguide
    in Optics express; optical society of america, Washington (Stati Uniti d'America)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • S. Sebastiani; G. Nunzi Conti; S. Pelli; G. C. Righini; A. Chiasera; M. Ferrari; C. Tosello (literal)
Pagina inizio
  • 1696 (literal)
Pagina fine
  • 1701 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-5-1696 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 13 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 5 (literal)
Note
  • ISI Web of Science (WOS) (literal)
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Optoelectronics and Photonics Department, Nello Carrara Institute of Applied Physics, IFAC-CNR, Via Panciatichi 64, I-50127, Firenze, Italy; Institute of Photonics and Nanotechnologies, Trento Section, IFN-CNR,Via Sommarie 14, I-38050 Povo (Trento), Italy; Physics Department, University of Trento, Via Sommarive 14, 38050 Povo (Trento), Italy. (literal)
Titolo
  • Characterization of a highly photorefractive RF-sputtered SiO2-GeO2 waveguide (literal)
Abstract
  • We present the characterization of highly photorefractive Er3+/Yb3+-doped 75SiO2-25GeO2 planar waveguides, single mode at 1550 nm, deposited by radio-frequency-magnetron-sputtering (RFMS) technique. Details of the deposition process are reported. The material presents an intense absorption band (alfa=10^3÷10^4 cm-1) in the UV region. Irradiations by a KrF excimer laser source at lambda = 248 nm have produced large positive (up to 3^10-3) refractive index changes, without the need of particular sensitization procedures. Direct measurements of UV photo-induced volume densification demonstrates that glass compaction accounts for large part of the refractive index change. Highly efficient photo-induced phase gratings have thus been fabricated in the waveguide. (literal)
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