Spectroscopic Ellipsometry and Polarimetry for Materials and Systems Analysis at the Nanometer Scale: State-of-the-art, Potential and Perspectives (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Spectroscopic Ellipsometry and Polarimetry for Materials and Systems Analysis at the Nanometer Scale: State-of-the-art, Potential and Perspectives (Articolo in rivista) (literal)

Anno

• 2009-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1007/s11051-009-9662-6 (literal)

Alternative label

• M. Losurdo; M. Bergmair; G. Bruno; D. Cattelan; C. Cobet; A. de Martino; K. Fleischer; Z. Dohcevic-Mitrovic; N. Esser; M. Galliet; R. Gajic; Dus an Hemzal; K. Hingerl; J. Humlicek; R. Ossik (2009)
  Spectroscopic Ellipsometry and Polarimetry for Materials and Systems Analysis at the Nanometer Scale: State-of-the-art, Potential and Perspectives
  in Journal of nanoparticle research
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• M. Losurdo; M. Bergmair; G. Bruno; D. Cattelan; C. Cobet; A. de Martino; K. Fleischer; Z. Dohcevic-Mitrovic; N. Esser; M. Galliet; R. Gajic; Dus an Hemzal; K. Hingerl; J. Humlicek; R. Ossik (literal)

Pagina inizio

• 1521 (literal)

Pagina fine

• 1554 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 11 (literal)

Rivista

• Journal of nanoparticle research (Rivista)

Note

• ISI Web of Science (WOS) (literal)
• Scopu (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• CNR-IMIP (literal)

Titolo

• Spectroscopic Ellipsometry and Polarimetry for Materials and Systems Analysis at the Nanometer Scale: State-of-the-art, Potential and Perspectives (literal)

Abstract

• This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measurement and analysis of nanometric films, metal nanoparticles and nanowires, semiconductor nanocrystals, and submicron periodic structures. We show that ellipsometry is capable of more than the determination of thickness and optical properties, and it can be exploited to gain information about process control, geometry factors, anisotropy, defects, and quantum confinement effects of nanostructures. (literal)

Prodotto di

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)

Autore CNR

• GIOVANNI BRUNO (Unità di personale interno)
• MARIA LOSURDO (Unità di personale interno)

Insieme di parole chiave

• Keywords of "Spectroscopic Ellipsometry and Polarimetry for Materials and Systems Analysis at the Nanometer Scale: State-of-the-art, Potential and Perspectives" (Insieme di parole chiave)

Incoming links:

Prodotto

• Istituto di Nanotecnologia (NANOTEC) (Istituto)
• Plasmi per la Scienza dei Materiali (MD.P03.025.001) (Modulo)

Autore CNR di

• GIOVANNI BRUNO (Unità di personale interno)
• MARIA LOSURDO (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Journal of nanoparticle research (Rivista)

Insieme di parole chiave di

• Keywords of "Spectroscopic Ellipsometry and Polarimetry for Materials and Systems Analysis at the Nanometer Scale: State-of-the-art, Potential and Perspectives" (Insieme di parole chiave)