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CVD of MgO Thin Films from Bis(methylcyclopentadienyl) magnesium (Articolo in rivista)

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CVD of MgO Thin Films from Bis(methylcyclopentadienyl) magnesium (Articolo in rivista) (literal)

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Carta G.; El Habra N.; Crociani L.; Rossetto G., Zanella P.; Zanella A.; Paolucci G.; Barreca D.; Tondello E. (2007)
CVD of MgO Thin Films from Bis(methylcyclopentadienyl) magnesium
in Chemical vapor deposition (Print); WILEY-V C H VERLAG GMBH, WEINHEIM (Germania)
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Carta G.; El Habra N.; Crociani L.; Rossetto G., Zanella P.; Zanella A.; Paolucci G.; Barreca D.; Tondello E. (literal)

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This work has been dedicated to the CVD of magnesium oxide thin films from bis(methylcyclopentadienyl)magnesium, and to a thorough characterization of the interrelations between film properties and synthesis parameters. The present results demonstrate that Mg(CH3C5H4)2 is an advantageous liquid precursor for the deposition of MgO thin films, thanks to its good volatility and the easy synthesis even from commercially available products. A comparison with results previously obtained from other precursors shows appreciably higher growth rate in the present case, with a maximum at 450 °C (50 nm min1). This result can be ascribed to a favorable protolytic cleavage of the MgC bond, favored by the oxophylic character of magnesium. The films obtained are well adherent to the substrates, transparent, and crack-free. Structural and compositional measurements have shown the formation of MgO free from undesired phases, with carbon presence limited to the outermost layers because of the reactivity of MgO with the outer atmosphere. All the films are characterized by a granular surface morphology, with roughness values always lower than 10 nm. Taken together, the present results demonstrate the amenability and feasibility of the proposed CVD approach for the synthesis of MgO films with favorable chemico-physical properties, thereby opening intriguing perspectives for eventual large-scale technological applications. (literal)

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1-5 : CNR-ICIS, C.so Stati Uniti, 4 35127 Padova (Italy) / 6,9 : Dipartimento di Scienze Chimiche and INSTM, Università di Padova, Via Marzolo,1, 35131 Padova (Italy) / 7 : Dipartimento di Chimica, Università Cà Foscari di Venezia, Dorsoduro 2137, 30123 Venezia (Italy) / 8,9 : CNR-ISTM and INSTM, Dipartimento di Scienze Chimiche, Università di Padova, Via Marzolo,1, 35131 Padova (Italy) / (literal)

Titolo

Abstract

Thin films of MgO are grown by CVD, with a high growth rate, on Si(001) and quartz substrates in the temperature range 400550 °C, using bis(methylcyclopentadienyl)magnesium [Mg(CH3-C5H4)2] as the precursor. The films obtained are investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and optical absorption, in order to investigate the interrelations between film properties and processing conditions. Cubic phase MgO (periclase) films, characterized by a low carbon contamination and a granular surface morphology, are obtained. (literal)

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