Production of clusters and thin films of nitrides, oxides and carbides by pulsed laser ablation and deposition. (Articolo in rivista)

Type
Label
  • Production of clusters and thin films of nitrides, oxides and carbides by pulsed laser ablation and deposition. (Articolo in rivista) (literal)
Anno
  • 2004-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1155/s1110662X04000042 (literal)
Alternative label
  • Orlando S.; Paladini A.; Santangata A.; Marotta V.; Parisi G.P.; Satta M.; Scuderi D.; Catone D.; Giardini A.; Mele A. (2004)
    Production of clusters and thin films of nitrides, oxides and carbides by pulsed laser ablation and deposition.
    in International Journal of Photoenergy (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Orlando S.; Paladini A.; Santangata A.; Marotta V.; Parisi G.P.; Satta M.; Scuderi D.; Catone D.; Giardini A.; Mele A. (literal)
Pagina inizio
  • 23 (literal)
Pagina fine
  • 28 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://www.hindawi.com/journals/ijp/2004/109473/abs/ (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 6 (literal)
Rivista
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  • Hindawi. (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
  • 6 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 1 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1 CNR-IMIP (sezione Istituto Materiali Speciali), I-85050 Tito Scalo (Pz), Italy 2 Dipartimento di Chimica, Università di Roma \"La Sapienza\", pl. A. Moro 5, I-00185 Roma, Italy 3 Facoltà di Farmacia, Dipartimento di Studi di Chimica e Tecnologia delle Sostanze Biologicamente Attive, Università di Roma \"La Sapienza\", pl. A. Moro 5, I-00185 Roma, Italy (literal)
Titolo
  • Production of clusters and thin films of nitrides, oxides and carbides by pulsed laser ablation and deposition. (literal)
Abstract
  • Thin films of boron nitride (BN) have been deposited on Si(1 0 0) substrates by reactive pulsed laser ablation (PLA) of a boron target in the presence of a 13.56 MHz radio frequency (RF) nitrogen plasma. The gaseous species have been deposited at several substrate temperatures, using the on-axis configuration. The film properties have been investigated by Scanning Electron Microscopy, Atomic Force Microscopy, Fourier Transformed Infrared Spectroscopy, and X-ray diffraction characterization techniques, and compared to those resulting from the conventional PLA method. The behavior of hexagonal-BN and cubic-BN phases grown by PLA as function of substrate temperature is also reported. (literal)
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