Surface morphology of Mn+ implanted Ge(100): A systematic investigation as a function of the implantation substrate temperature (Articolo in rivista)

Type

• Articolo in rivista (Classe)
• Prodotto della ricerca (Classe)

Label

• Surface morphology of Mn+ implanted Ge(100): A systematic investigation as a function of the implantation substrate temperature (Articolo in rivista) (literal)

Anno

• 2007-01-01T00:00:00+01:00 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi

• 10.1016/j.susc.2006.11.075 (literal)

Alternative label

• Ottaviano, L; Verna, A; Grossi, V; Parisse, P; Piperno, S; Passacantando, M; Impellizzeri, G; Priolo, F (2007)
  Surface morphology of Mn+ implanted Ge(100): A systematic investigation as a function of the implantation substrate temperature
  in Surface science
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Ottaviano, L; Verna, A; Grossi, V; Parisse, P; Piperno, S; Passacantando, M; Impellizzeri, G; Priolo, F (literal)

Pagina inizio

• 2623 (literal)

Pagina fine

• 2627 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url

• http://dx.doi.org/10.1016/j.susc.2006.11.075 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 601 (literal)

Rivista

• Surface science (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali

• 4 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Univ Aquila, Dipartimento Fis, I-67010 Coppito, Italy; Univ Catania, MATIS, INFM, CNR, I-95123 Catania, Italy (literal)

Titolo

• Surface morphology of Mn+ implanted Ge(100): A systematic investigation as a function of the implantation substrate temperature (literal)

Abstract

• Ge (100) wafers were implanted with 100 keV Mn+ ions with a dose of 2 x 10(16) ions/cm(2) at different temperatures, ranging from 300 to 573 K. The surface morphology of implanted samples, analyzed with scanning electron microscopy and atomic force microscopy measurements, reveals for the 300-463 K implant temperature range the formation of a surface swelled and porous film, containing sponge-like structures. On the contrary, samples implanted in the 513-573 K temperature range present an atomically flat surface, with a roughness less than 1 nm, indicating that crystalline order has been preserved. X-ray photoemission spectroscopy depth profiling measurements indicate the presence of adsorbed oxygen in the porous layer of lower-temperature implanted samples, as well the presence of a large Mn concentration below the expected end of range for impinging ions. Mn and 0 concentrations at anomalously great depths are maximum in the 413 K implanted sample, indicating that the phenomenon of ion beam induced porosity is best favored at a well defined temperature. (C) 2006 Elsevier B.V. All rights reserved. (literal)

Prodotto di

• Controllo su scala atomica dei materiali per dispositivi innovativi elettronici e fotonici basati su silicio. (MD.P05.006.001) (Modulo)

Autore CNR

• GIULIANA IMPELLIZZERI (Unità di personale interno)
• FRANCESCO PRIOLO (Persona)

Insieme di parole chiave

• Parole chiave di "Surface morphology of Mn+ implanted Ge(100): A systematic investigation as a function of the implantation substrate temperature" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• FRANCESCO PRIOLO (Persona)
• GIULIANA IMPELLIZZERI (Unità di personale interno)

Prodotto

• Controllo su scala atomica dei materiali per dispositivi innovativi elettronici e fotonici basati su silicio. (MD.P05.006.001) (Modulo)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Surface science (Rivista)

Insieme di parole chiave di

• Parole chiave di "Surface morphology of Mn+ implanted Ge(100): A systematic investigation as a function of the implantation substrate temperature" (Insieme di parole chiave)