http://www.cnr.it/ontology/cnr/individuo/prodotto/ID167917
Fluorine counter doping effect in B-doped Si (Articolo in rivista)
- Type
- Label
- Fluorine counter doping effect in B-doped Si (Articolo in rivista) (literal)
- Anno
- 2007-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1063/1.2790373 (literal)
- Alternative label
Impellizzeri, G; Mirabella, S; Piro, AM; Grimaldi, MG; Priolo, F; Giannazzo, F; Raineri, V; Napolitani, E; Carnera, A (2007)
Fluorine counter doping effect in B-doped Si
in Applied physics letters; AIP, American institute of physics, Melville, NY (Stati Uniti d'America)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Impellizzeri, G; Mirabella, S; Piro, AM; Grimaldi, MG; Priolo, F; Giannazzo, F; Raineri, V; Napolitani, E; Carnera, A (literal)
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- Catania Univ, Dipartimento Fis Astron, MATIS, CNR,INFM, I-95123 Catania, Italy; CNR, IMM, Sezione Catania, I-95121 Catania, Italy; Univ Padua, Dipartimento Fis, MATIS, CNR,INFM, I-35131 Padua, Italy (literal)
- Titolo
- Fluorine counter doping effect in B-doped Si (literal)
- Abstract
- We investigated the effect of F on the electrical activity of B-doped junctions in preamorphized Si. It is shown that while the carrier dose introduced by B is reduced in the presence of F, no indication of B-F complexes formation can be found and B maintains its full substitutionality. Investigations on F-enriched crystalline Si demonstrated and quantified the n-type doping of F. These results clarify that the loss of holes in junctions coimplanted with B and F is not due to a chemical interaction between B and F, but simply to a dopant compensation effect. (c) 2007 American Institute of Physics. (literal)
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