Artifacts identification in apertureless near-field optical microscopy (Articolo in rivista)

Type
Label
  • Artifacts identification in apertureless near-field optical microscopy (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Alternative label
  • Gucciardi, PG; Bachelier, G; Allegrini, M; Ahn, J; Hong, M; Chang, S; Jhe, W; Hong, SC; Baek, SH (2007)
    Artifacts identification in apertureless near-field optical microscopy
    in Journal of applied physics
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Gucciardi, PG; Bachelier, G; Allegrini, M; Ahn, J; Hong, M; Chang, S; Jhe, W; Hong, SC; Baek, SH (literal)
Pagina inizio
  • 064303 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 101 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, Ist Proc Chimicofis, Sez Messina, I-98123 Messina, Italy Univ Lyon 1, CNRS, Lab Spect Ion & Mol, UMR 5579, F-69622 Villeurbanne, France Univ Pisa, Dipartimento Fis E Fermi, I-56127 Pisa, Italy INFM, CNR, PolyLab, I-56127 Pisa, Italy Seoul Natl Univ, Ctr Near Field Atom Photon Technol, Seoul 151747, South Korea Seoul Natl Univ, Sch Phys, Seoul 151747, South Korea Korea Univ, Dept Phys, Seoul 136713, South Korea (literal)
Titolo
  • Artifacts identification in apertureless near-field optical microscopy (literal)
Abstract
  • The aim of this paper is to provide criteria for optical artifacts recognition in reflection-mode apertureless scanning near-field optical microscopy, implementing demodulation techniques at higher harmonics. We show that optical images acquired at different harmonics, although totally uncorrelated from the topography, can be entirely due to far-field artifacts. Such observations are interpreted by developing the dipole-dipole model for the detection scheme at higher harmonics. The model, confirmed by the experiment, predicts a lack of correlation between the topography and optical images even for structures a few tens of nanometers high, due to the rectification effect introduced by the lock-in amplifier used for signal demodulation. Analytical formulas deduced for the far-field background permit to simulate and identify all the different fictitious patterns to be expected from metallic nanowires or nanoparticles of a given shape. In particular, the background dependence on the tip-oscillation amplitude is put forward as the cause of the error-signal artifacts, suggesting, at the same time, specific fine-tuning configurations for background-free imaging. Finally a careful analysis of the phase signal is carried out. In particular, our model correctly interprets the steplike dependence observed experimentally of the background phase signal versus the tip-sample distance, and suggests to look for smooth variations of the phase signal for unambiguous near-field imaging assessment. (c) 2007 American Institute of Physics. (literal)
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