UV photoimprinting of channel waveguides on active SiO2-GeO2 sputtered thin films (Articolo in rivista)

Type
Label
  • UV photoimprinting of channel waveguides on active SiO2-GeO2 sputtered thin films (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.2355472 (literal)
Alternative label
  • G. Nunzi Conti; S.Berneschi; M. Brenci; S. Pelli; S. Sebastiani; G.C. Righini; C. Tosello; A. Chiasera; M. Ferrari. (2006)
    UV photoimprinting of channel waveguides on active SiO2-GeO2 sputtered thin films
    in Applied physics letters; American Institute Of Physics (AIP), Melville (Stati Uniti d'America)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • G. Nunzi Conti; S.Berneschi; M. Brenci; S. Pelli; S. Sebastiani; G.C. Righini; C. Tosello; A. Chiasera; M. Ferrari. (literal)
Pagina inizio
  • 121102-1 (literal)
Pagina fine
  • 121102-3 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://apl.aip.org/resource/1/applab/v89/i12/p121102_s1 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 89 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • MDF Laboratory, \"Nello Carrara\" Institute of Applied Physics (IFAC), CNR, Via Madonna del Piano 10, I-50019 Sesto Fiorentino (FI), Italy; Physics Department, University of Trento, CSMFO Group, Via Sommarive 14, I-38050 Povo (Trento), Italy; Institute of Photonics and Nanotechnologies (IFN), Trento Section, CNR, CSMFO Group, Via Sommarive 14, I-38050 Povo (Trento), Italy. (literal)
Titolo
  • UV photoimprinting of channel waveguides on active SiO2-GeO2 sputtered thin films (literal)
Abstract
  • We report on direct UV photoimprinting of channel waveguides on sputtered 75SiO2–25GeO2 mol % thin films doped with erbium and ytterbium. The films, after annealing, constitute good-quality slab waveguides, single mode at 1550 nm. UV exposure through an amplitude mask defines channel waveguides. We show that the index change distribution in the channel can be simply related to the UV induced densification profile. Propagation losses are less than 0.3 dB/cm at 1300 nm for both planar and channel waveguides. The fabrication procedure is simpler and cheaper than conventional technologies, so it represents a convenient way for the fabrication of low loss active optical integrated circuits. (literal)
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