Photonic band gaps analysis of Thue-Morse multilayers made of porous silicon (Articolo in rivista)

Type
Label
  • Photonic band gaps analysis of Thue-Morse multilayers made of porous silicon (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1364/OE.14.006264 (literal)
Alternative label
  • Moretti, L; Rea, I; Rotiroti, L; Rendina, I; Abbate, G; Marino, A; De Stefano, L (2006)
    Photonic band gaps analysis of Thue-Morse multilayers made of porous silicon
    in Optics express
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Moretti, L; Rea, I; Rotiroti, L; Rendina, I; Abbate, G; Marino, A; De Stefano, L (literal)
Pagina inizio
  • 6264 (literal)
Pagina fine
  • 6272 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 14 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Univ Mediterranea Reggio Calabria, DIMET, I-89060 Reggio Di Calabria, Italy; CNR, Dept Naples, Inst Microelect & Microsyst, I-80131 Naples, Italy; Univ Naples Federico II, Dept Phys Sci, I-80126 Naples, Italy; Univ Naples Federico II, INFM Coherentia, I-80126 Naples, Italy (literal)
Titolo
  • Photonic band gaps analysis of Thue-Morse multilayers made of porous silicon (literal)
Abstract
  • Dielectric aperiodic Thue-Morse structures up to 128 layers have been fabricated by using porous silicon technology. The photonic band gap properties of Thue-Morse multilayers have been theoretically investigated by means of the transfer matrix method and the integrated density of states. The theoretical approach has been compared and discussed with the reflectivity measurements at variable angles for both the transverse electric and transverse magnetic polarizations of light. The photonic band gap regions, wide 70 nm and 90 nm, included between 0 and 30, have been observed for the sixth and seventh orders, respectively. (literal)
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