Drift mobility in quantum nanostructures by scanning probe microscopy (Articolo in rivista)

Type
Label
  • Drift mobility in quantum nanostructures by scanning probe microscopy (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1063/1.2168502 (literal)
Alternative label
  • Giannazzo, F; Raineri, V; Mirabella, S; Impellizzeri, G; Priolo, F (2006)
    Drift mobility in quantum nanostructures by scanning probe microscopy
    in Applied physics letters
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Giannazzo, F; Raineri, V; Mirabella, S; Impellizzeri, G; Priolo, F (literal)
Pagina inizio
  • 43117 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 88 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • CNR, IMM, Sez Catania, I-95121 Catania, Italy; Catania Univ, MATIS, CNR, INFM, I-95123 Catania, Italy; Catania Univ, Dipartimento Fis & Astron, I-95123 Catania, Italy (literal)
Titolo
  • Drift mobility in quantum nanostructures by scanning probe microscopy (literal)
Abstract
  • We used scanning capacitance microscopy (SCM) and scanning spreading resistance microscopy (SSRM) to determine the drift hole mobility in nanometer thick Si/Si0.75Ge0.25/Si quantum wells (QWs), from the carrier concentration profiles (obtained by SCM) and the local resistivity values (obtained by SSRM). A relevant decrease of the hole mobility at room temperature was observed when reducing the QW width from 10 nm down to 1 nm. This effect has been explained in terms of the increasing role of surface scattering at the Si/SiGe interface for lower QW widths. (literal)
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