Direct nanopattern of hybrid sol-gel films (Articolo in rivista)

Type
Label
  • Direct nanopattern of hybrid sol-gel films (Articolo in rivista) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Alternative label
  • Della Giustina, G; Brusatin, G; Guglielmi, M; Romanato, F (2007)
    Direct nanopattern of hybrid sol-gel films
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Della Giustina, G; Brusatin, G; Guglielmi, M; Romanato, F (literal)
Pagina inizio
  • 1382 (literal)
Pagina fine
  • 1385 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 27 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Univ Padua, Dept Mech Engn Mat Sector, I-35131 Padua, Italy; CNR, INFM, Lab TASC, I-34012 Basovizza Trieste, Italy; Nanyang Technol Univ, Inst Mat Sci & Technol, Singapore, Singapore (literal)
Titolo
  • Direct nanopattern of hybrid sol-gel films (literal)
Abstract
  • We propose a direct nanopatterning process of hybrid sol-gel materials useful for photonics application. A specific organic-inorganic film based on 3-glycidoxypropyltrimethoxysilane with epoxy rings acting as silica network modifier and sensitive to radiation has been developed, with a controlled inorganic crosslinking degree and an almost total absence of organic polymerization. The film has been exposed to electron beam or X-ray synchrotron radiation. Both the interactions induce the polymerization of the organic part of the film generating its hardening after post exposure baking. The exposed material becomes insoluble determining a negative-resist like behaviour: the nanolithographic process results from the dissolution of the un-exposed areas in proper solvents. After its optimization unexpected spatial resolution of the pattern were achieved with structures below 200 nm sized, both with electron beam and X-ray lithography. The real advantages of this approach are that almost all the significant parameters for a photonic device (refractive index, light absorption and emission) can be tailored during the material synthesis and with a single lithographic step the device is ready without any further etching process, undoubtedly simplifying the photonic devices nanofabrication. A demonstration test has been performed doping the film with commercial Rhodamine 6G that after the exposure didn't degraded its luminescence efficiency. (c) 2006 Elsevier B.V. All rights reserved. (literal)
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