Application of ion beam analysis to the selective sublimation processing of thin films for gas sensing (Articolo in rivista)

Type
Label
  • Application of ion beam analysis to the selective sublimation processing of thin films for gas sensing (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Alternative label
  • Vomiero, A; Scian, C; Della Mea, G; Guidi, V; Martinelli, G; Schiffrer, G; Comini, E; Ferroni, M; Sberveglieri, G (2006)
    Application of ion beam analysis to the selective sublimation processing of thin films for gas sensing
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Vomiero, A; Scian, C; Della Mea, G; Guidi, V; Martinelli, G; Schiffrer, G; Comini, E; Ferroni, M; Sberveglieri, G (literal)
Pagina inizio
  • 302 (literal)
Pagina fine
  • 305 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 249 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Ist Nazl Fis Nucl, Lab Nazl Legnaro, I-35020 Legnaro, Italy; CNR, INFM, SENSOR Lab, I-25133 Brescia, Italy; Dipartimento Ingn Mat & Tecnol Ind, I-38050 Trento, Italy; Univ Ferrara, Dipartimento Fis, I-44100 Ferrara, Italy; Univ Ferrara, Ist Nazl Fis Nucl, I-44100 Ferrara, Italy; Univ Brescia, Dipartimento Chim & Fis Ingn & Mat, I-25133 Brescia, Italy; Univ Brescia, INFM, CNR, I-25133 Brescia, Italy (literal)
Titolo
  • Application of ion beam analysis to the selective sublimation processing of thin films for gas sensing (literal)
Abstract
  • Ion beam analysis was successfully applied to a novel technique, named selective sublimation process (SSP), for deposition of nanostructured gas-sensing films through reactive sputtering. The method consists of the co-deposition of a mixed oxide, one of which has a relatively low sublimation temperature. Annealing at suitable temperature causes the sublimation of the most volatile compound, leaving a layer with adjustable composition. The appropriate choice of thermal treatments and the consequent tailoring of the composition play a crucial role in the determination of the microstructural properties. We developed a model based on diffusion equations that provides a useful guide to control the deposition and processing parameters and we applied the model on the systems TiO2-WO3 and TiO2-MoO3. Rutherford backscattering (RBS) was demonstrated to be effective for the characterization of the diffusion and sublimation processes during SSP. Experimental results fully agree with theoretical prediction, and allowed the calculation of all the parameters involved in SSP. (c) 2006 Elsevier B.V. All rights reserved. (literal)
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