http://www.cnr.it/ontology/cnr/individuo/prodotto/ID136757
EBIC as a tool for the study of gettering phenomena in Silicon (Contributo in volume (capitolo o saggio))
- Type
- Label
- EBIC as a tool for the study of gettering phenomena in Silicon (Contributo in volume (capitolo o saggio)) (literal)
- Anno
- 2008-01-01T00:00:00+01:00 (literal)
- Alternative label
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#citta
- Trivandrum-695 023, Kerala, In (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
- In: Beam Injection Based Nanocharacterization of Advanced Materials. pp. 153 - 167. G. Salviati, T. Sekiguchi, S. Heun, A. Gustafsson Eds (eds.). Trivandrum-695 023, Kerala, India: Research Signpost, 2008. (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#descrizioneSinteticaDelProdotto
- After a review of a recent model of interpretation of the EBIC contrast at extended defects and of the most used gettering procedures, the paper illustrates how EBIC can be used to study gettering phenomena in silicon. The potentiality of EBIC to get quantitative information on some gettering processes, like internal and p+ gettering as well as poly-Si gettering, is demonstrated. It is shown that by using EBIC it is possible to establish which is the contaminant and the range of its initial density in not-intentionally contaminated epi Si. This is achieved by comparing the features of internal gettering, as determined by EBIC, to those of p+ gettering. (literal)
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- CNR-IMEM, Parma (literal)
- Titolo
- EBIC as a tool for the study of gettering phenomena in Silicon (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#inCollana
- Beam Injection Based Nanocharacterization of Advanced Materials (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
- 978-81-308-0226-8 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#curatoriVolume
- G. Salviati, T. Sekiguchi, S. Heun, A. Gustafsson (literal)
- Abstract
- After a review of a recent model of interpretation
of the EBIC contrast at extended defects and of the
most used gettering procedures, the paper illustrates
how EBIC can be used to study gettering phenomena
in silicon. The potentiality of EBIC to get quantitative
information on some gettering processes, like internal
and p+ gettering as well as poly-Si gettering, is
demonstrated. It is shown that by using EBIC it is
possible to establish which is the contaminant and the
range of its initial density in not-intentionally
contaminated epi Si. This is achieved by comparing
the features of internal gettering, as determined by
EBIC, to those of p+ gettering. (literal)
- Editore
- Prodotto di
- Autore CNR
- Insieme di parole chiave
Incoming links:
- Prodotto
- Autore CNR di
- Editore di
- Insieme di parole chiave di