http://www.cnr.it/ontology/cnr/individuo/prodotto/ID1325
Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures (Articolo in rivista)
- Type
- Label
- Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures (Articolo in rivista) (literal)
- Anno
- 2006-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.jnoncrysol.2005.10.056 (literal)
- Alternative label
Ricciardi, C; Ballarini, V; Galli, M; Liscidini, M; Andreani, LC; Losurdo, M; Bruno, G; Lettieri, S; Gesuele, F; Maddalena, P; Giorgis, F (2006)
Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures
in Journal of non-crystalline solids
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Ricciardi, C; Ballarini, V; Galli, M; Liscidini, M; Andreani, LC; Losurdo, M; Bruno, G; Lettieri, S; Gesuele, F; Maddalena, P; Giorgis, F (literal)
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- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
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- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Politecn Turin, Dept Phys, Mat & Microsyst Lab, I-10129 Turin, Italy; Univ Pavia, Phys Dept A Volta, I-27100 Pavia, Italy; CNR, IMIP, Inst Inorgan Methodol & Plasmas, I-70126 Bari, Italy; Univ Naples, CRS Coherentia, Phys Dept Federico II, I-80126 Naples, Italy (literal)
- Titolo
- Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures (literal)
- Abstract
- a-Si1-xNx:H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach-Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities. (c) 2006 Elsevier B.V. All rights reserved. (literal)
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