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Multiple micro mirrors for X-ray focusing and collimation (Articolo in rivista)

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Multiple micro mirrors for X-ray focusing and collimation (Articolo in rivista) (literal)

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Bukreeva, I; Surpi, A; Gerardino, A; Lagomarsino, S; Perennes, F; Altissimo, M; Cabrini, S; Carpentiero, A; Vicenzo, A; Cavallotti, P (2006)
Multiple micro mirrors for X-ray focusing and collimation
in Optics communications (Print)
(literal)

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Bukreeva, I; Surpi, A; Gerardino, A; Lagomarsino, S; Perennes, F; Altissimo, M; Cabrini, S; Carpentiero, A; Vicenzo, A; Cavallotti, P (literal)

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Inst Foton & Nanotecnol, CNR, Rome, Italy; Sincrotrone Trieste SS, Basovizza, TS, Italy; INFM, TASC SS, Basovizza, TS, Italy; Politecn Milan, Dipartimento Chim Mat & Ingn Chim, I-20133 Milan, Italy (literal)

Titolo

Abstract

A novel route for fabrication of compact optical system for X-rays is presented. It is based on the extensive use of tools developed for microelectronics and micromechanics: electron beam lithography, optical lithography and X-ray lithography. Virtually any shape can be obtained in order to match the system to the different needs. In this paper, we concentrate the attention on focusing system made by nested mirrors. A system for synchrotron radiation source and one for laboratory source have been designed and simulated by a ray-tracing code developed ad hoc. The main parameters and the fabrication tolerance errors have been evaluated. The first prototypes have been produced following different fabrication routes. They are presented here together with considerations for future developments. (c) 2005 Elsevier B.V. All rights reserved. (literal)

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