MOCVD of niobium nitrides and oxy-nitrides using an all-nitrogen-coordinated precursor: thin-film deposition and mechanistic study (Comunicazione a convegno)

Type
Label
  • MOCVD of niobium nitrides and oxy-nitrides using an all-nitrogen-coordinated precursor: thin-film deposition and mechanistic study (Comunicazione a convegno) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Alternative label
  • D. Bekermann, D. Barreca, A. Devi, A. Gasparotto, R.A. Fischer (2008)
    MOCVD of niobium nitrides and oxy-nitrides using an all-nitrogen-coordinated precursor: thin-film deposition and mechanistic study
    in 214th meeting of The Electrochemical Society, Honolulu, Hawaii, 12-17 Ottobre 2008
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • D. Bekermann, D. Barreca, A. Devi, A. Gasparotto, R.A. Fischer (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1,3,5: Inorganic Chemistry II - Organometallics & Materials, Ruhr-University Bochum, 44801 - Bochum, Germany 2: ISTM-CNR and INSTM, Department of Chemistry, Padova University, 35131 - Padova, Italy 4: Department of Chemistry, Padova University and INSTM, 35131 Padova, Italy (literal)
Titolo
  • MOCVD of niobium nitrides and oxy-nitrides using an all-nitrogen-coordinated precursor: thin-film deposition and mechanistic study (literal)
Prodotto di
Autore CNR

Incoming links:


Prodotto
Autore CNR di
data.CNR.it