Chemical composition, microstructure and morphology as responsible for the electrical sensitivity of nanostructured SnO2-based thin films to CO gas (Abstract/Poster in atti di convegno)

Type

• Abstract/Poster in atti di convegno (Classe)
• Prodotto della ricerca (Classe)

Label

• Chemical composition, microstructure and morphology as responsible for the electrical sensitivity of nanostructured SnO2-based thin films to CO gas (Abstract/Poster in atti di convegno) (literal)

Anno

• 2003-01-01T00:00:00+01:00 (literal)

Alternative label

• Canevali C., Mari C.M., Mattoni M., Ruffo R., Scotti R., Morazzoni F., Armelao L., Barreca D., Tondello E., Bontempi E., Depero L.E. (2003)
  Chemical composition, microstructure and morphology as responsible for the electrical sensitivity of nanostructured SnO2-based thin films to CO gas
  in European Materials Research Society Meeting 2003, Strasbourg, France
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Canevali C., Mari C.M., Mattoni M., Ruffo R., Scotti R., Morazzoni F., Armelao L., Barreca D., Tondello E., Bontempi E., Depero L.E. (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note

• 10-13 giugno 2003 (literal)

Titolo

• Chemical composition, microstructure and morphology as responsible for the electrical sensitivity of nanostructured SnO2-based thin films to CO gas (literal)

Prodotto di

• Institute of molecular science and technologies (ISTM) (Istituto)

Autore CNR

• LIDIA ARMELAO (Persona)
• DAVIDE BARRECA (Unità di personale interno)

Incoming links:

Prodotto

• Institute of molecular science and technologies (ISTM) (Istituto)

Autore CNR di

• DAVIDE BARRECA (Unità di personale interno)
• LIDIA ARMELAO (Persona)