Characterization of thermally treated Mo/Si multilayer mirrors with standing wave-assisted EXAFS (Articolo in rivista)

Type
Label
  • Characterization of thermally treated Mo/Si multilayer mirrors with standing wave-assisted EXAFS (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.nimb.2005.12.023 (literal)
Alternative label
  • Rovezzi, M; D'Acapito, F; Patelli, A; Rigato, V; Salmaso, G; Bontempi, E; Davoli, I (2006)
    Characterization of thermally treated Mo/Si multilayer mirrors with standing wave-assisted EXAFS
    in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Rovezzi, M; D'Acapito, F; Patelli, A; Rigato, V; Salmaso, G; Bontempi, E; Davoli, I (literal)
Pagina inizio
  • 127 (literal)
Pagina fine
  • 130 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 246 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • ESRF, CRG, GILDA, INFM OGG, F-38043 Grenoble, France; Univ Roma Tor Vergata, I-00133 Rome, Italy; Ist Nazl Fis Nucl, Lab Nazl Legnaro, I-35020 Legnaro, Italy (literal)
Titolo
  • Characterization of thermally treated Mo/Si multilayer mirrors with standing wave-assisted EXAFS (literal)
Abstract
  • In the last years multilayer mirrors for applications in the extreme ultra-violet (ELTV) region have reached high reflectivity performances, leading such optics suitable for new generation lithography and astrophysical applications. One of the most studied systems is the Mo/Si but a still challenging task is the study of the interfaces. This work aims to use the X-ray absorption spectroscopy technique assisted by standing wave (SW-XAS) as a way to investigate interface composition. Samples consisted in 10-periods Mo/Si multilayers deposited on silicon substrates by RF magnetron sputtering heat treated at temperatures between 240 degrees C and 600 degrees C. The study shows a difference in the results from SW-XAS spectra collected in different positions of the standing wave and reveal the presence of molybdenum silicide (MoSi2) at the interfaces. The comparison of SW-XAS data with simulations based on X-ray reflectivity data show that the two interfaces are asymmetric. Significant structural changes are observed increasing the annealing temperature and the MoSi, percentage rise from 14% (as deposited) to 70% (600 degrees C). (c) 2005 Elsevier B.V. All rights reserved. (literal)
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