Parole chiave di "Strain relaxation mechanism in a reverse compositionally graded SiGe heterostructure"

Label

• Parole chiave di "Strain relaxation mechanism in a reverse compositionally graded SiGe heterostructure" (literal)
• Keywords of "Strain relaxation mechanism in a reverse compositionally graded SiGe heterostructure" (literal)

Insieme di parole chiave di

• Strain relaxation mechanism in a reverse compositionally graded SiGe heterostructure (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Ha membro

• HIGH-RATES (Parola chiave)
• THREADING DISLOCATION DENSITY (Parola chiave)
• CHEMICAL-VAPOR-DEPOSITION (Parola chiave)
• HETEROEPITAXIAL LAYERS (Parola chiave)
• MOLECULAR-BEAM EPITAXY (Parola chiave)

Incoming links:

Insieme di parole chiave

• Strain relaxation mechanism in a reverse compositionally graded SiGe heterostructure (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)

Membro di

• MOLECULAR-BEAM EPITAXY (Parola chiave)
• CHEMICAL-VAPOR-DEPOSITION (Parola chiave)
• HIGH-RATES (Parola chiave)
• THREADING DISLOCATION DENSITY (Parola chiave)
• HETEROEPITAXIAL LAYERS (Parola chiave)