http://www.cnr.it/ontology/cnr/individuo/unitaDiPersonaleInterno/MATRICOLA1164
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- Damage and recovery in doped SOI layers after high energy implantation (Contributo in atti di convegno) (Prodotto della ricerca)
- Electron diffraction with ten nanometer beam size for strain analysis of nanodevices (Articolo in rivista) (Prodotto della ricerca)
- Strain field reconstruction in shallow trench isolation structures by CBED and LACBED (Articolo in rivista) (Prodotto della ricerca)
- Application of convergent beam electron diffraction to two-dimensional strain mapping in silicon devices (Articolo in rivista) (Prodotto della ricerca)
- Structural and analytical characterization by scanning transmission electron microscopy of silicon-based nanostructures (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- MIcrochimica Acta: Proceedings of the 9th Workshop of European Microbean analysis Society (EMAS) and the 3rd Meeting og the International Union of Microbean Analysis Societies (IUMAS), Florence, Italy, may 22-26, 2005 (Monografia o trattato scientifico) (Prodotto della ricerca)
- Strain determination in silicon microstructures by combined convergent beam electron diffraction, process, simulation, and micro-Raman spectroscopy (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Analysis of localised strains in crystals by convergent beam electron diffraction (Contributo in volume (capitolo o saggio)) (Prodotto della ricerca)
- Effect of nitrogen implantation at the SiO2/SiC interface on the electron mobility and free carrier density in 4H-SiC metal oxide semiconductor field effect transistor channel (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Damage and recovery in doped SOI layers after high energy implantation (Articolo in rivista) (Prodotto della ricerca)
- Application of the parametric bootstrap method to determine statistical errors in quantitative X-ray microanalysis of thin films (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Modern developments and applications in microbeam analysis. Proceedings of the 9(th) Workshop of the European Microbeam Analysis Society (EMAS) and the 3(rd) Meeting of the International Union of Microbeam Analysis Societies (IUMAS), Florence, Italy, May (Articolo in rivista) (Prodotto della ricerca)
- Numerical analysis of the process-induced stresses in silicon microstructures: application to micromachined cantilever (Articolo in rivista) (Prodotto della ricerca)
- Dislocation generation in device fabrication process (Articolo in rivista) (Prodotto della ricerca)
- Microanalisi a raggi X e microdiffrazione a fascio convergente:applicazioni al Silicio (Contributo in volume (capitolo o saggio)) (Prodotto della ricerca)
- La microanalisi a Raggi X in microscopia elettronica TEM e SEM (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Nano beam and convergent beam elecron diffraction for strain anaysis in nano-electronics (Abstract/Poster in atti di convegno) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1302)
- Quantitative strain mapping in nanoelectronic silicon devices by convergent beam electron diffraction (Contributo in volume (capitolo o saggio)) (Prodotto della ricerca)
- Stress engineering in Si based micro structures using technology computer-aided design (Articolo in rivista) (Prodotto della ricerca)
- HOLZ Line Splitting coupled to a Recursive Procedure. A Tool for the Displacement Field Determination in Nanostructures (Contributo in atti di convegno) (Prodotto della ricerca)
- Improving spatial resolution of convergent beam electron diffraction strain mapping in silicon microstructures (Articolo in rivista) (Prodotto della ricerca)
- Nitridation of the SiO2/SiC Interface by N+ implantation: Hall versus field effect mobility in n-channel planar 4H-SiC MOSFETs (Articolo in rivista) (Prodotto della ricerca)
- Method for determination of the displacement field in patterned nanostructures by TEM/CBED analysis of split high-order Laue zone line profiles (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Convergent beam electron diffraction investigation of strain induced by Ti self-aligned silicides in shallow trench Si isolation structures (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Techniques for mechanical strain analysis in sub-micrometer structures: TEM/CBED, micro-Raman spectroscopy, X-ray microdiffraction and modeling (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Boron nitride thin films deposited by RF plasma reactive pulsed laser ablation as interlayer between WC-Co hard metals and CVD diamond films (Articolo in rivista) (Prodotto della ricerca)
- Damage and recovery in boron doped silicon on insulator layers after high energy Si+ implantation (Articolo in rivista) (Prodotto della ricerca)
- Quantitative thin-film X-ray microanalysis by STEM/HAADF: Statistical analysis for precision and accuracy determination (Articolo in rivista) (Prodotto della ricerca)
- Split HOLZ lines analysis as a tool to map the strain field in patterned nanostructure (Contributo in atti di convegno) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1301)
- Software CBED (Progetti) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1725)
- Strain mapping in deep sub-micron Si devices by convergent beam electron diffraction in the STEM (Articolo in rivista) (Prodotto della ricerca)
- Diaframma per microscopio elettronico e procedimento per realizzare tale diaframma (Brevetto) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1601)
- Nitridation of the SiO(2)/SiC interface by N(+) implantation: Hall versus field effect mobility in n-channel planar 4H-SiC MOSFETs (Contributo in atti di convegno) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1301)
- X-Ray Microanalysis Combined with Monte Carlo Simulation for the Analysis of Layered Thin Films: The Case of Carbon Contamination (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Damage and recovery in boron doped SOI layers after high energy implantation (Contributo in atti di convegno) (Prodotto della ricerca)
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- Http://www.cnr.it/ontology/persone.owl#argomentoDiRicercaSimile
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- Split HOLZ lines analysis as a tool to map the strain field in patterned nanostructure (Contributo in atti di convegno) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1301)
- Stress engineering in Si based micro structures using technology computer-aided design (Articolo in rivista) (Prodotto della ricerca)
- Improving spatial resolution of convergent beam electron diffraction strain mapping in silicon microstructures (Articolo in rivista) (Prodotto della ricerca)
- Strain mapping in deep sub-micron Si devices by convergent beam electron diffraction in the STEM (Articolo in rivista) (Prodotto della ricerca)
- Quantitative thin-film X-ray microanalysis by STEM/HAADF: Statistical analysis for precision and accuracy determination (Articolo in rivista) (Prodotto della ricerca)
- Damage and recovery in boron doped silicon on insulator layers after high energy Si+ implantation (Articolo in rivista) (Prodotto della ricerca)
- X-Ray Microanalysis Combined with Monte Carlo Simulation for the Analysis of Layered Thin Films: The Case of Carbon Contamination (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Application of convergent beam electron diffraction to two-dimensional strain mapping in silicon devices (Articolo in rivista) (Prodotto della ricerca)
- Strain determination in silicon microstructures by combined convergent beam electron diffraction, process, simulation, and micro-Raman spectroscopy (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Damage and recovery in doped SOI layers after high energy implantation (Articolo in rivista) (Prodotto della ricerca)
- Modern developments and applications in microbeam analysis. Proceedings of the 9(th) Workshop of the European Microbeam Analysis Society (EMAS) and the 3(rd) Meeting of the International Union of Microbeam Analysis Societies (IUMAS), Florence, Italy, May (Articolo in rivista) (Prodotto della ricerca)
- Numerical analysis of the process-induced stresses in silicon microstructures: application to micromachined cantilever (Articolo in rivista) (Prodotto della ricerca)
- Dislocation generation in device fabrication process (Articolo in rivista) (Prodotto della ricerca)
- Application of the parametric bootstrap method to determine statistical errors in quantitative X-ray microanalysis of thin films (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Structural and analytical characterization by scanning transmission electron microscopy of silicon-based nanostructures (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Effect of nitrogen implantation at the SiO2/SiC interface on the electron mobility and free carrier density in 4H-SiC metal oxide semiconductor field effect transistor channel (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- La microanalisi a Raggi X in microscopia elettronica TEM e SEM (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Nitridation of the SiO2/SiC Interface by N+ implantation: Hall versus field effect mobility in n-channel planar 4H-SiC MOSFETs (Articolo in rivista) (Prodotto della ricerca)
- Nano beam and convergent beam elecron diffraction for strain anaysis in nano-electronics (Abstract/Poster in atti di convegno) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1302)
- Quantitative strain mapping in nanoelectronic silicon devices by convergent beam electron diffraction (Contributo in volume (capitolo o saggio)) (Prodotto della ricerca)
- MIcrochimica Acta: Proceedings of the 9th Workshop of European Microbean analysis Society (EMAS) and the 3rd Meeting og the International Union of Microbean Analysis Societies (IUMAS), Florence, Italy, may 22-26, 2005 (Monografia o trattato scientifico) (Prodotto della ricerca)
- Software CBED (Progetti) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1725)
- Convergent beam electron diffraction investigation of strain induced by Ti self-aligned silicides in shallow trench Si isolation structures (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Electron diffraction with ten nanometer beam size for strain analysis of nanodevices (Articolo in rivista) (Prodotto della ricerca)
- Strain field reconstruction in shallow trench isolation structures by CBED and LACBED (Articolo in rivista) (Prodotto della ricerca)
- Method for determination of the displacement field in patterned nanostructures by TEM/CBED analysis of split high-order Laue zone line profiles (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- HOLZ Line Splitting coupled to a Recursive Procedure. A Tool for the Displacement Field Determination in Nanostructures (Contributo in atti di convegno) (Prodotto della ricerca)
- Boron nitride thin films deposited by RF plasma reactive pulsed laser ablation as interlayer between WC-Co hard metals and CVD diamond films (Articolo in rivista) (Prodotto della ricerca)
- Damage and recovery in doped SOI layers after high energy implantation (Contributo in atti di convegno) (Prodotto della ricerca)
- Diaframma per microscopio elettronico e procedimento per realizzare tale diaframma (Brevetto) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1601)
- Techniques for mechanical strain analysis in sub-micrometer structures: TEM/CBED, micro-Raman spectroscopy, X-ray microdiffraction and modeling (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Analysis of localised strains in crystals by convergent beam electron diffraction (Contributo in volume (capitolo o saggio)) (Prodotto della ricerca)
- Damage and recovery in boron doped SOI layers after high energy implantation (Contributo in atti di convegno) (Prodotto della ricerca)
- Microanalisi a raggi X e microdiffrazione a fascio convergente:applicazioni al Silicio (Contributo in volume (capitolo o saggio)) (Prodotto della ricerca)
- Nitridation of the SiO(2)/SiC interface by N(+) implantation: Hall versus field effect mobility in n-channel planar 4H-SiC MOSFETs (Contributo in atti di convegno) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1301)
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