Journal of the Electrochemical Society
- Label
- Journal of the Electrochemical Society (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi
- Atomic Layer Deposition of Al-Doped ZrO2 Thin Films as Gate Dielectric for In0.53Ga0.47As (Articolo in rivista) (Prodotto della ricerca)
- Residual crystalline silicon phase in silicon-rich-oxide films subjected to high temperature annealing (Articolo in rivista) (Prodotto della ricerca)
- Role of the Oxygen Content in the GeO2 Passivation of Ge Substrates as a Function of the Oxidizer (Articolo in rivista) (Prodotto della ricerca)
- Chemical and Structural Properties of a TaN/HfO2 Gate Stack Processed Using Atomic Vapor Deposition (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Dielectric Properties of Materials Showing Constant-Phase-Element (CPE) Impedance Response (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Alternative label
- Journal of the Electrochemical Society (literal)
- JES (literal)
- Language
- eng (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#issn
- 1945-7111 (literal)
- Preferred label
- Journal of the Electrochemical Society (literal)
- Publisher
- Electrochemical Society [Pennington, NJ] : USA (literal)
Incoming links:
- Rivista
- Role of the Oxygen Content in the GeO2 Passivation of Ge Substrates as a Function of the Oxidizer (Articolo in rivista) (Prodotto della ricerca)
- Atomic Layer Deposition of Al-Doped ZrO2 Thin Films as Gate Dielectric for In0.53Ga0.47As (Articolo in rivista) (Prodotto della ricerca)
- Chemical and Structural Properties of a TaN/HfO2 Gate Stack Processed Using Atomic Vapor Deposition (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Dielectric Properties of Materials Showing Constant-Phase-Element (CPE) Impedance Response (Articolo in rivista) (http://www.cnr.it/ontology/cnr/individuo/prodotto/TIPO1101)
- Residual crystalline silicon phase in silicon-rich-oxide films subjected to high temperature annealing (Articolo in rivista) (Prodotto della ricerca)
