From Sub-micrometric to Nanometric Electrical Investigation of Resistance Switching Operations in NiO Films Dedicated to Resistive RAM Applications (Contributo in atti di convegno)

Type
Label
  • From Sub-micrometric to Nanometric Electrical Investigation of Resistance Switching Operations in NiO Films Dedicated to Resistive RAM Applications (Contributo in atti di convegno) (literal)
Anno
  • 2010-01-01T00:00:00+01:00 (literal)
Alternative label
  • Deleruyelle D, Dumas C, Carmona M, Muller C, Spiga S, Fanciulli M (2010)
    From Sub-micrometric to Nanometric Electrical Investigation of Resistance Switching Operations in NiO Films Dedicated to Resistive RAM Applications
    in MRS Fall Meeting: Symposium K: Oxide Nanoelectronics, Boston, USA
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Deleruyelle D, Dumas C, Carmona M, Muller C, Spiga S, Fanciulli M (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1. Departement Micro et Nanoelectronique, Institut Microelectronique Nanosciences de Provence (IM2NP) - Universite d'Aix-Marseille, Marseille, France; 2. Laboratorio MDM, IMM-CNR, Agrate Brianza, Italy; 3. Dipartimento di Scienza dei Materiali, Università degli Studi di Milano-Bicocca, Milano, Italy. (literal)
Titolo
  • From Sub-micrometric to Nanometric Electrical Investigation of Resistance Switching Operations in NiO Films Dedicated to Resistive RAM Applications (literal)
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