Fabrication of high performance RF-MEMS structures on surface planarised LTCC substrates (Contributo in atti di convegno)

Type
Label
  • Fabrication of high performance RF-MEMS structures on surface planarised LTCC substrates (Contributo in atti di convegno) (literal)
Anno
  • 2007-01-01T00:00:00+01:00 (literal)
Alternative label
  • Buttiglione R, Dispenza M, Fiorello AM, Tuominen J, Kautio K, Ollila J, Jaakola T, Rönkä K, Catoni S, Pochesci D, Marcelli R (2007)
    Fabrication of high performance RF-MEMS structures on surface planarised LTCC substrates
    in European Microelectronics and Packaging Conference and Exhibition of the International Microelectronic and Packaging Society, IMAPS-EMPC 2007, Oulu, Finland, June 17-20 2007
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Buttiglione R, Dispenza M, Fiorello AM, Tuominen J, Kautio K, Ollila J, Jaakola T, Rönkä K, Catoni S, Pochesci D, Marcelli R (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#titoloVolume
  • Procedings of the European Microelectronics and Packaging Conference and Exhibition of the International Microelectronic and Packaging Society, IMAPS-EMPC 2007 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
  • Fabrication of high performance thin-film RF-MEMS structures directly on surface treated LTCC substrates has been investigated and demonstrated. After extensive testing of different LTCC materials as well as the characterization of lapping and polishing conditions, Heraeus CT707 was chosen as substrate material. The fabrication process for high performance thin film patterning and RF-MEMS structures has been developed, optimised and demonstrated. The release process for RF-MEMS structures has been optimised taking also into account the compatibility with LTCC materials. Also, hermetic sealing for the MEMS structures using brazing both with Kovar and ceramic lids has been designed, optimised and demonstrated. (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • SELEX-SI, Roma VTT Oulu - Finland CNR-IMM Roma (literal)
Titolo
  • Fabrication of high performance RF-MEMS structures on surface planarised LTCC substrates (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
  • 978-952-99751-1-2 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autoriVolume
  • AA.VV. (literal)
Abstract
  • Fabrication of high performance thin­film RF­MEMS structures directly on surface treated LTCC substrates has been  investigated  and  demonstrated.  After  extensive  testing  of  different  LTCC  materials  as  well  as  the characterization  of  lapping  and  polishing  conditions,  Heraeus  CT707  was  chosen  as  substrate  material.  The fabrication  process  for  high  performance  thin  film  patterning  and  RF­MEMS  structures  has  been  developed, optimised  and  demonstrated.  The  release process for RF­MEMS  structures  has  been  optimised  taking also  into account  the  compatibility  with  LTCC  materials.  Also,  hermetic  sealing  for  the  MEMS  structures  using  brazing both with Kovar and ceramic lids has been designed, optimised and demonstrated. (literal)
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