Structural and compositional investigation of high k praseodymium oxide films deposited by MOCVD (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Structural and compositional investigation of high k praseodymium oxide films deposited by MOCVD (Articolo in rivista) (literal)

Anno

• 2003-01-01T00:00:00+01:00 (literal)

Alternative label

• Lo Nigro R., Toro R., Malandrino G., Bongiorno C., Raineri V., Fragalà I.L. (2003)
  Structural and compositional investigation of high k praseodymium oxide films deposited by MOCVD
  in Institute of physics conference series
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Lo Nigro R., Toro R., Malandrino G., Bongiorno C., Raineri V., Fragalà I.L. (literal)

Pagina inizio

• 409 (literal)

Pagina fine

• 409-412 (literal)

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• MICROSCOPY OF SEMICONDUCTING MATERIALS 2003 (literal)

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• 108 (literal)

Rivista

• Institute of physics conference series (Rivista)

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• 4 (literal)

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• Different praseodymium oxide phases have been obtained by varying oxygen partial pressure during the MOCVD process at 750degreesC on Si(100). Hexagonal Pr2O3 has been obtained under oxygen deficient conditions, while at oxygen partial pressure higher than 0.7 torr oxidized phases, such as Pr6O11 and/or PrO2, are dominant. Transmission electron microscopy (TEM) and energy filtered transmission electron microscopy (EFTEM) analyses have been used to characterize structural, compositional and morphological features of praseodymium oxide films. (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• IMM - Istituto per la microelettronica e microsistemi Dipartimento Scienze Chimiche, Universtà di Catania (literal)

Titolo

• Structural and compositional investigation of high k praseodymium oxide films deposited by MOCVD (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn

• 0-7503-0979-2 (literal)

Abstract

• Different praseodymium oxide phases have been obtained by varying oxygen partial pressure during the MOCVD process at 750°C on Si(100). Hexagonal Pr2O3 have been obtained under oxygen deficient conditions, while at oxygen partial pressure higher than 0.7 torr oxidized phases, such as Pr6O11 and/or PrO2, are dominant. Transmission electron microscopy (TEM) and energy filtered transmission electron microscopy (EF-TEM) analyses have been used to characterize structural, compositional and morphological features of praseodymium oxide films. (literal)

Prodotto di

• Institute for microelectronics and microsystems (IMM) (Istituto)

Autore CNR

• ROBERTA GRAZIA TORO (Unità di personale interno)
• VITO RAINERI (Persona)
• CORRADO BONGIORNO (Unità di personale interno)
• RAFFAELLA LO NIGRO (Unità di personale interno)

Incoming links:

Autore CNR di

• VITO RAINERI (Persona)
• RAFFAELLA LO NIGRO (Unità di personale interno)
• CORRADO BONGIORNO (Unità di personale interno)
• ROBERTA GRAZIA TORO (Unità di personale interno)

Prodotto

• Institute for microelectronics and microsystems (IMM) (Istituto)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Institute of physics conference series (Rivista)