Plasma Enhanced Chemical Vapor Deposition of silicon dioxide-like films: a chemical structure study for barrier applications (Contributo in atti di convegno)

Type
Label
  • Plasma Enhanced Chemical Vapor Deposition of silicon dioxide-like films: a chemical structure study for barrier applications (Contributo in atti di convegno) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Alternative label
  • A. Coclite, A. Milella, F.Palumbo, R. d’Agostino (2008)
    Plasma Enhanced Chemical Vapor Deposition of silicon dioxide-like films: a chemical structure study for barrier applications
    in PSE2008, Garmisch
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • A. Coclite, A. Milella, F.Palumbo, R. d’Agostino (literal)
Titolo
  • Plasma Enhanced Chemical Vapor Deposition of silicon dioxide-like films: a chemical structure study for barrier applications (literal)
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