http://www.cnr.it/ontology/cnr/individuo/prodotto/ID86012
A novel organosilicon precursor for low temperature plasma deposition of silicon nitride-like thin films (Contributo in atti di convegno)
- Type
- Label
- A novel organosilicon precursor for low temperature plasma deposition of silicon nitride-like thin films (Contributo in atti di convegno) (literal)
- Anno
- 2005-01-01T00:00:00+01:00 (literal)
- Alternative label
R. Di Mundo; R. d'Â’Agostino; F. Fracassi; F. Palumbo (2005)
A novel organosilicon precursor for low temperature plasma deposition of silicon nitride-like thin films
in 17th International Symposium on Plasma Chemistry (ISPC-17), Toronto, Canada
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- R. Di Mundo; R. d'Â’Agostino; F. Fracassi; F. Palumbo (literal)
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Department of Chemistry, University of Bari, via Orabona 4, 70126 Bari, Italy
Institute for Inorganic Methodologies and Plasmas (IMIP) - CNR, via Orabona 4, 70126 Bari, Italy (literal)
- Titolo
- A novel organosilicon precursor for low temperature plasma deposition of silicon nitride-like thin films (literal)
- Prodotto di
- Autore CNR
Incoming links:
- Prodotto
- Autore CNR di