A novel organosilicon precursor for low temperature plasma deposition of silicon nitride-like thin films (Contributo in atti di convegno)

Type
Label
  • A novel organosilicon precursor for low temperature plasma deposition of silicon nitride-like thin films (Contributo in atti di convegno) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Alternative label
  • R. Di Mundo; R. d'Â’Agostino; F. Fracassi; F. Palumbo (2005)
    A novel organosilicon precursor for low temperature plasma deposition of silicon nitride-like thin films
    in 17th International Symposium on Plasma Chemistry (ISPC-17), Toronto, Canada
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • R. Di Mundo; R. d'Â’Agostino; F. Fracassi; F. Palumbo (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Department of Chemistry, University of Bari, via Orabona 4, 70126 Bari, Italy Institute for Inorganic Methodologies and Plasmas (IMIP) - CNR, via Orabona 4, 70126 Bari, Italy (literal)
Titolo
  • A novel organosilicon precursor for low temperature plasma deposition of silicon nitride-like thin films (literal)
Prodotto di
Autore CNR

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Prodotto
Autore CNR di
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