Reactivity of ZnO: Impact of Polarity and Nanostructure (Contributo in atti di convegno)

Type
Label
  • Reactivity of ZnO: Impact of Polarity and Nanostructure (Contributo in atti di convegno) (literal)
Anno
  • 2005-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1016/j.spmi.2005.08.014 (literal)
Alternative label
  • M. Losurdo, M.M. Giangregorio, P. Capezzuto, G. Bruno, G. Malandrino, A. Blandino, I. Fragalà (2005)
    Reactivity of ZnO: Impact of Polarity and Nanostructure
    in Spring Meeting of the European-Materials-Research-Society, Strasbourg, FRANCE, MAY 31-JUN 03, 2005
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • M. Losurdo, M.M. Giangregorio, P. Capezzuto, G. Bruno, G. Malandrino, A. Blandino, I. Fragalà (literal)
Pagina inizio
  • 291 (literal)
Pagina fine
  • 299 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://www.cnr.it (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 38 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 4-6 (literal)
Note
  • ISI Web of Science (WOS) (literal)
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1. CNR, IMIP, I-70126 Bari, Italy 2. INSTM, UdR Bari, I-70126 Bari, Italy 3. Univ Catania, Dipartimento Sci Chim, I-95125 Catania, Italy 4. INSTM, UdR Catania, I-95125 Catania, Italy (literal)
Titolo
  • Reactivity of ZnO: Impact of Polarity and Nanostructure (literal)
Abstract
  • The effects of atomic hydrogen and nitrogen produced by remote r.f. H-2 and N-2 plasmas on the structure, morphology, and optical and electrical properties of Zn- and O-polar ZnO crystals and on ZnO thin films grown by metal-organic chemical vapour deposition (MOCVD) have been studied. It is found that the Zn-polar form is highly reactive with atomic hydrogen, while the O-polar form is almost inert. This difference in reactivity allows one to discern the O-polarity of the (0001) oriented ZnO thin films grown by MOCVD. A decrease of the resistivity of the grain-like MOCVD films is found upon atomic hydrogen treatment. Conversely, atomic nitrogen treatment results in p-type doping of the ZnO film and in an improvement of the surface morphology and microstructure (literal)
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