Structural and Spectroscopic Assessment of Er3+- activated SiO2-HfO2 Glass Ceramics Planar Waveguides (Contributo in atti di convegno)

Type
Label
  • Structural and Spectroscopic Assessment of Er3+- activated SiO2-HfO2 Glass Ceramics Planar Waveguides (Contributo in atti di convegno) (literal)
Anno
  • 2008-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.4028/www.scientific.net/AST.55.56 (literal)
Alternative label
  • L. Minati, G. Speranza, Y. Jestin, C. Armellini, A. Chiappini, A. Chiasera, M. Ferrari, G.C. Righini (2008)
    Structural and Spectroscopic Assessment of Er3+- activated SiO2-HfO2 Glass Ceramics Planar Waveguides
    in 3rd International Conference ”Smart Materials, Structures and Systems”, Acireale, Sicily, Italy, 8 -13 June, 2008
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • L. Minati, G. Speranza, Y. Jestin, C. Armellini, A. Chiappini, A. Chiasera, M. Ferrari, G.C. Righini (literal)
Pagina inizio
  • 56 (literal)
Pagina fine
  • 61 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 55 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
  • Advances in Science and Technology Vol. 55 (2008) pp 118-126. Invited lecture: Proceedings 3rd International Conference ”Smart Materials, Structures and Systems”, Acireale, Sicily, Italy, 8 -13 June, 2008 (literal)
Note
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • FBK-IRST, via Sommarive 18, 38050 Povo, Italy; CNR-IFN, CSMFO Group, Via alla Cascata, 56/C, 38050 Povo-Trento, Italy; CNR, Department of Materials and Devices, via dei Taurini 19, 00185 Roma, Italy; Optoelectronic Technology Laboratory, Nello Carrara Institute of Applied Physics, IFAC - CNR, Via Madonna del Piano 10, 50019 Sesto Fiorentino (Firenze), Italy (literal)
Titolo
  • Structural and Spectroscopic Assessment of Er3+- activated SiO2-HfO2 Glass Ceramics Planar Waveguides (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#isbn
  • 9783908158127 (literal)
Abstract
  • Two series of xHfO2 - (100-x) SiO2 (x=10, 20, 30 mol%) glass-ceramics planar waveguides doped with 0.3 mol% Er3+ ions were prepared by the sol-gel route. A thermal treatment at 1000°C was applied to the second series of samples to nucleate HfO2 crystals. The waveguides were analyzed by X-ray photoelectron spectroscopy to study the effect of the Hf concentration and of the annealing on the material structure. XPS shows that in the first series of samples a Hf concentration threshold exists. Above this threshold the material undergoes a spinodal decomposition with formation of HfO2 rich domains. In the second series of samples the presence of thermal treatment lowers the concentration threshold so that the phase separation occurs also at a Hf concentration of 10%mol. In the waveguides where spinodal decomposition in present, the emission spectra from the Er 3+ ions reveal a sensible narrowing of the 4I 13/2 -> 4I15/2 line. This demonstrates the presence of a crystalline environment for the Er3+ ions since the inhomogeneous broadening due to the disordered glassy network is suppressed. These results may have important implications for the fabrication of photonic devices with increased efficiency. (literal)
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