Residual Stress in Silicon Nitride Thin Films Deposited by ECR-PECVD (Contributo in atti di convegno)

Type
Label
  • Residual Stress in Silicon Nitride Thin Films Deposited by ECR-PECVD (Contributo in atti di convegno) (literal)
Anno
  • 2003-01-01T00:00:00+01:00 (literal)
Alternative label
  • Cianci E. and Foglietti V. (2003)
    Residual Stress in Silicon Nitride Thin Films Deposited by ECR-PECVD
    in Mat. Res. Soc. Symp. 2003 Proc. ?Thin Films - Stresses and Mechanical Properties?, Boston Usa
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Cianci E. and Foglietti V. (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
  • Vol. 795 (literal)
Titolo
  • Residual Stress in Silicon Nitride Thin Films Deposited by ECR-PECVD (literal)
Prodotto di
Autore CNR

Incoming links:


Prodotto
Autore CNR di
data.CNR.it