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Ion beam analyses and electrical characterization of substitutional Fe properties in Fe implanted InP (Articolo in rivista)
- Type
- Label
- Ion beam analyses and electrical characterization of substitutional Fe properties in Fe implanted InP (Articolo in rivista) (literal)
- Anno
- 2006-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1016/j.nimb.2006.03.158 (literal)
- Alternative label
Cesca, T; Verna, A; Mattei, G; Gasparotto, A; Fraboni, B; Impellizzeri, G; Priolo, F (2006)
Ion beam analyses and electrical characterization of substitutional Fe properties in Fe implanted InP
in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Cesca, T; Verna, A; Mattei, G; Gasparotto, A; Fraboni, B; Impellizzeri, G; Priolo, F (literal)
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- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Univ Padua, Dipartimento Fis, I-35131 Padua, Italy; Univ Bologna, Dipartmento Fis, I-40127 Bologna, Italy; Univ Catania, Dipartimento Fis, I-95123 Catania, Italy; INFM, MATIS, I-95123 Catania, Italy (literal)
- Titolo
- Ion beam analyses and electrical characterization of substitutional Fe properties in Fe implanted InP (literal)
- Abstract
- We have investigated the structural and electrical behavior of Fe centers introduced in InP by high temperature ion implantation. The effect of post-implantation annealing treatments on the crystal damage and the lattice location of the Fe atoms was studied by PIXE-RBS-channeling measurements. Current-voltage measurements and simulations were used to characterize the electrical properties due to the presence of Fe-related deep traps. The results show that the background n-doping density plays a crucial role in controlling the annealing behavior and the electrical activation of the Fe centers. (c) 2006 Elsevier B.V. All rights reserved. (literal)
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