Erbium/Ytterbium-activated Silica-Titania Planar and Channel Waveguides prepared by rf-sputtering. (Comunicazione a convegno)

Type
Label
  • Erbium/Ytterbium-activated Silica-Titania Planar and Channel Waveguides prepared by rf-sputtering. (Comunicazione a convegno) (literal)
Anno
  • 2003-01-01T00:00:00+01:00 (literal)
Alternative label
  • Chiasera A., Montagna M. , Tosello C. , Gonçalves R.R. , Chiappini A. , Ferrari M. , Zampedri L. , Pelli S. , Righini G.C. , Monteil A. , Foglietti V. , Minotti A. , Almeida R.M. , Marques A. , Soares V. (2003)
    Erbium/Ytterbium-activated Silica-Titania Planar and Channel Waveguides prepared by rf-sputtering.
    in Photonics West 2003: Integrated Optoelectronic Devices, Rare-Earth-Doped Materials and Devices VII, S. Jose' (USA), 25-31 January 2003
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Chiasera A., Montagna M. , Tosello C. , Gonçalves R.R. , Chiappini A. , Ferrari M. , Zampedri L. , Pelli S. , Righini G.C. , Monteil A. , Foglietti V. , Minotti A. , Almeida R.M. , Marques A. , Soares V. (literal)
Pagina inizio
  • 38 (literal)
Pagina fine
  • 46 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 4990 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
  • Proc. SPIE Vol. 4940, pp.38-46 (literal)
Note
  • Scopu (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Dip. di Fisica, INFM, Università di Trento, via Sommarive 14, 38050 Povo-Trento, Italy; Dip. di Ing. dei Materiali, Università di Trento, via Mesiano 44, 38050 Povo-Trento, Italy; CNR-IFN, Inst. of Photonics/Nanotechnologies, CSMFO Group, via Sommarive 14, 38050 Povo-Trento, Italy; CNR-IFAC, Inst. of Appl. Physics Nello Carrara, Optoelectronics Dept., Via Panciatichi 64, 50127 Firenze, Italy; POMA, UMR CNRS 6136, Université d'Angers, 2 Boulevard Lavoisier, 49045 Angers Cédex 01, France; CNR-IFN, Inst. of Photonics/Nanotechnologies, MEMS Group, Via Cineto Romano 42, 00156 Roma, Italy; Depart. Eng. de Materials, Instituto Superior Tecnico, Av. Rovisco Pais, 1049-001 Lisboa, Portugal; INESC, Ctr. Microsistemas e Nanotecnologias, R. Alves Redol 9-3D, 1000-029 Lisboa, Portugal (literal)
Titolo
  • Erbium/Ytterbium-activated Silica-Titania Planar and Channel Waveguides prepared by rf-sputtering. (literal)
Abstract
  • SiO2 - TiO2: Er3- - Yb3+ waveguides were prepared by rf-sputtering technique. The active films were deposited on silica-on-silicon and v-SiO2 substrates. The parameters of preparation were chosen in order to optimize the waveguides for operation in the NIR region with particular attention to the minimization of losses. The thickness of the waveguides and the refractive index at 632.8 and 543.5 nm were measured by an m-line apparatus. The losses, for the TE0 mode, were evaluated at 632.8 and 1300 nm. Roughness measurements were carried out by means of a stylus profilometer. The structural properties were investigated with several techniques such as Energy Dispersive Spectroscopy and Raman Spectroscopy. All waveguides were single-mode at 1550 nm. An attenuation coefficient equal or lower than 0.2 dB/cm was measured both at 632.8 nm and 1300 nm. The emission of 4Ii13/2 -> 4Ii15/2 of Er3+ ion transition with a 40 nm bandwidth was observed upon excitation in the TE0 mode at 981 and 514.5 nm. Back energy transfer from Er3+ to Yb3+ was demonstrated by measurement of Yb3+ emission upon Er3+ excitation at 514.5 nm. Photoluminescence excitation Spectroscopy was used to obtain information about the effective excitation efficiency of Er3+ ions by co-doping with Yb3+ ions. Channel waveguides in rib configuration were obtained by etching the active film by a wet etching process. Scanning Electron Microscopy was used to analyze the morphology of the waveguides. (literal)
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