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Structural, optical and electrical properties of helium diluted a-Si1-xCx : films deposited by PECVD (Articolo in rivista)
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- Structural, optical and electrical properties of helium diluted a-Si1-xCx : films deposited by PECVD (Articolo in rivista) (literal)
- Anno
- 2006-01-01T00:00:00+01:00 (literal)
- Alternative label
Loulou, M; Gharbi, R; Fathallah, MA; Ambrosone, G; Coscia, U; Abbate, G; Marino, A; Ferrero, S; Tresso, E (2006)
Structural, optical and electrical properties of helium diluted a-Si1-xCx : films deposited by PECVD
in Journal of non-crystalline solids
(literal)
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- Loulou, M; Gharbi, R; Fathallah, MA; Ambrosone, G; Coscia, U; Abbate, G; Marino, A; Ferrero, S; Tresso, E (literal)
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- Ecole Super Sci & Tech Tunis, Dept Phys, Tunis 1008, Tunisia; Univ Naples Federico II, INFM Coherentia, I-80126 Naples, Italy; Univ Naples Federico II, Dipartimento Sci Fisiche, I-80126 Naples, Italy; Politecn Turin, Dipartimento Fis & Unita, Ist Nazl Fis Mat, I-10129 Turin, Italy (literal)
- Titolo
- Structural, optical and electrical properties of helium diluted a-Si1-xCx : films deposited by PECVD (literal)
- Abstract
- We present results on optical, structural and electrical properties of a-Si1-xCx:H films deposited by plasma enhanced chemical vapor deposition in the low power regime, with C fraction from 0 to 0.28. The absorption coefficient has been obtained in the region 0.73-4.5 eV by means of ellipsometry, reflectance-transmittance and photothermal deflection spectroscopy. The addition of carbon in the alloy increases the disorder and the density of defects: samples deposited with high carbon content have poorer optoelectronic properties. Two conduction regimes are observed: extended state conduction and hopping conduction in the conduction band tail. A visible PL peak that widens and shifts to higher energies as the carbon content increases has been observed. (c) 2006 Elsevier B.V. All rights reserved. (literal)
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