Extreme-ultraviolet multilayer coatings with high spectral purity for solar imaging (Articolo in rivista)

Type
Label
  • Extreme-ultraviolet multilayer coatings with high spectral purity for solar imaging (Articolo in rivista) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1364/AO.48.005432 (literal)
Alternative label
  • Suman M.; Pelizzo M.G.; Windt D.L.; Nicolosi P. (2009)
    Extreme-ultraviolet multilayer coatings with high spectral purity for solar imaging
    in Applied optics
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Suman M.; Pelizzo M.G.; Windt D.L.; Nicolosi P. (literal)
Pagina inizio
  • 5432 (literal)
Pagina fine
  • 5437 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://www.opticsinfobase.org/ao/abstract.cfm?uri=ao-48-29-5432 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 48 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 29 (literal)
Note
  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1,2,4 : National Research Council, National Institute for the Physics of the Matter, Laboratory for Ultraviolet and X-ray Optical Research, via Gradenigo, 6B-35131 Padova, Italy / 1,2,4 : Department of Information Engineering, University of Padova, via Gradenigo, 6B-35131 Padova, Italy / 3 : Reflective X-Ray Optics LLC, 1361 Amsterdam Avenue, New York, NY 10027, United States (literal)
Titolo
  • Extreme-ultraviolet multilayer coatings with high spectral purity for solar imaging (literal)
Abstract
  • Future solar experiments designed to perform solar plasma diagnostics will also be based on extreme-ultravilet observations. Multilayer (ML) optics are essential in this spectral region since these coatings have high reflectivity at normal incidence. Typically, the reflectivity curve of a ML coating has a small but finite bandwidth, and this can be a serious drawback when several spectral lines fall within the bandwidth. In fact, spectral lines emitted by different ion species can correspond to different plasma conditions. We present the design, realization, and characterization of an innovative ML structure with high reflectivity coupled with a strong rejection ratio for two adjacent spectral features. The key element is an optimized capping layer structure deposited on top of the ML that preserves the performance reflectance at the target wavelength and at the same time suppresses the reflectance at specific adjacent wavelengths. Application to the Fe xv3×106 K coronal emission line at 28.4 nm with rejection of the He ii Lyman-? line at 30.4 nm is presented. (literal)
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