Electron beam deposited tantalum carbide film on titanium (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Electron beam deposited tantalum carbide film on titanium (Articolo in rivista) (literal)

Anno

• 2006-01-01T00:00:00+01:00 (literal)

Alternative label

• A.Latini, S.M.Barinov, D.Ferro, J.V.Rau, R.Scandurra (2006)
  Electron beam deposited tantalum carbide film on titanium
  in Powder metallurgy progress (Koice)
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• A.Latini, S.M.Barinov, D.Ferro, J.V.Rau, R.Scandurra (literal)

Pagina inizio

• 20 (literal)

Pagina fine

• 25 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 6 (literal)

Rivista

• Powder metallurgy progress (Rivista)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo

• 1 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• Roma University \"La Sapienza\", Roma, Italy Institute for Physical Chemistry of Ceramics, Russian Academy of Sciences, Moscow, Russia ISMN - CNR Institute of Nanostructured Materials, Roma, Italy (literal)

Titolo

• Electron beam deposited tantalum carbide film on titanium (literal)

Abstract

• Tantalum carbide (TaC) thin films were electron beam deposited on a roughened surface of pure titanium using a hot-pressed TaC ceramic target. The as-deposited film retained the stoichiometry of the TaC target, but after exposure to 750°C in vacuum the TaC film transformed to Ta2C and developed cracks. The intrinsic hardness of the as-deposited film was obtained via mathematical extrapolation from the multiple hardness measurements of the film/substrate system under varying indentation loads. The hardness thereby obtained is 12.4 GPa - somewhat lower than the hardness reported for bulk TaC. The degree of the reduction of hardness was significantly lower than that revealed for titanium carbide EB deposited films. Possible reasons of the hardness lowering are discussed. TaC films could find a potential application to protect titanium parts of orthopedic devices. (literal)

Prodotto di

• Aspetti chimico fisici dei processi fondamentali (PM.P05.005.001) (Modulo)
• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)

Autore CNR

• DANIELA FERRO (Unità di personale interno)
• DZHULIETTA RAU (Persona)

Insieme di parole chiave

• Keywords of "Electron beam deposited tantalum carbide film on titanium" (Insieme di parole chiave)

Incoming links:

Prodotto

• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)
• Aspetti chimico fisici dei processi fondamentali (PM.P05.005.001) (Modulo)

Autore CNR di

• DZHULIETTA RAU (Persona)
• DANIELA FERRO (Unità di personale interno)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#rivistaDi

• Powder metallurgy progress (Rivista)

Insieme di parole chiave di

• Keywords of "Electron beam deposited tantalum carbide film on titanium" (Insieme di parole chiave)