An atomic force microscopy study of the effects of surface treatments of diamond films produced by chemical vapor deposition (Articolo in rivista)

Type
Label
  • An atomic force microscopy study of the effects of surface treatments of diamond films produced by chemical vapor deposition (Articolo in rivista) (literal)
Anno
  • 2006-01-01T00:00:00+01:00 (literal)
Alternative label
  • Podesta, A; Salerno, M; Ralchenko, V; Bruzzi, M; Sciortino, S; Khmelnitskii, R; Milani, P (2006)
    An atomic force microscopy study of the effects of surface treatments of diamond films produced by chemical vapor deposition
    in Diamond and related materials
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Podesta, A; Salerno, M; Ralchenko, V; Bruzzi, M; Sciortino, S; Khmelnitskii, R; Milani, P (literal)
Pagina inizio
  • 1292 (literal)
Pagina fine
  • 1299 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 15 (literal)
Rivista
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Univ Milan, INFM, Dipartimento Fis, I-20133 Milan, Italy; Univ Milan, CIMAINA, I-20133 Milan, Italy; Politecn Milan, Dipartimento Ingn Gest, I-20133 Milan, Italy; Russian Acad Sci, Inst Gen Phys, Moscow 119991, Russia; Univ Florence, INFM, I-50139 Florence, Italy; Univ Florence, Dipartimento Energet, I-50139 Florence, Italy; PN Lebedev Phys Inst, Moscow 119991, Russia (literal)
Titolo
  • An atomic force microscopy study of the effects of surface treatments of diamond films produced by chemical vapor deposition (literal)
Abstract
  • Diamond films produced by chemical vapor deposition (CVD) technique must be polished and machined in order to be used for many applications (windows, heat spreaders, surface acoustic wave devices, etc). We present an Atomic Force Microscopy study of the effects of mechanical polishing, hydrogen plasma etching, and ion implantation followed by annealing and chemical etching, on the morphology of Microwave Plasma CVD polycrystalline diamond films. Both growth and nucleation sides of 0.3-0.5 mm thick free-standing films were characterized. We found that grain boundaries and anisotropy of mechanical properties (hardness and wear rate) mostly contribute to the overall roughness of Microwave Plasma CVD diamond films, which is below 0.2 nm at the single-grain scale. The further deposition of a diamond overlayer, even of small thickness, on highly polished polycrystalline diamond, results in a variety of growth modes and different growth rates depending on the grain orientation, leading to the roughness increase. Hydrogen plasma etching proved to be effective for inducing morphological and chemical changes on the surface, while an ion implantation/annealing/etching can be used for precise removal of thin diamond layers. The latter approach is promising for diamond lithography. (c) 2005 Elsevier B.V. All rights reserved. (literal)
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