http://www.cnr.it/ontology/cnr/individuo/prodotto/ID65412
Photolithography by a tunable electro-optical lithium niobate phase array (Articolo in rivista)
- Type
- Label
- Photolithography by a tunable electro-optical lithium niobate phase array (Articolo in rivista) (literal)
- Anno
- 2007-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1007/s11801-007-6204-2 (literal)
- Alternative label
Paturzo M, Del Core C, Grilli S, De Nicola S, Ferraro P, De Natale P, Coppola G, Iodice M, Gioffré M (2007)
Photolithography by a tunable electro-optical lithium niobate phase array
in Optoelectronics Letters (Print)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Paturzo M, Del Core C, Grilli S, De Nicola S, Ferraro P, De Natale P, Coppola G, Iodice M, Gioffré M (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#pagineTotali
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Istituto Nazionale di Ottica Applicata-CNR and LENS,European Laboratory for Nonlinear Spectroscopy, via Campi Flegrei 34, 80078-Pozzuoli (NA), Italy
Istituto Microelettronica e Microsistemi del CNR, Via P. Castellino 111, 80131, Napoli, Italy (literal)
- Titolo
- Photolithography by a tunable electro-optical lithium niobate phase array (literal)
- Abstract
- Photolithography experiments are performed by means of an optical phase mask with electrooptically tunable phase step. The phase mask consists of a 2-dimensional hexagonal lattice of inverted ferroelectric domains fabricated on a z-cut lithium niobate substrate. The electro-optically tunable phase step, between inverted domain, is obtained by the application of an external electric field along the z axis of the crystal via transparent electrodes. The collimated beam of an argon laser passes through the phase mask and the near field intensity patterns, at different planes of the Talbot length and for different values of the applied voltage, are used for photolithographic experiments. Preliminary results are shown and further applications are discussed. (literal)
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- Autore CNR
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