Bifunctional microstructured films and surfaces obtained by soft lithography from breath figure arrays (Articolo in rivista)

Type
Label
  • Bifunctional microstructured films and surfaces obtained by soft lithography from breath figure arrays (Articolo in rivista) (literal)
Anno
  • 2009-01-01T00:00:00+01:00 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
  • 10.1039/b819811j (literal)
Alternative label
  • Vohra V.; Yunus A.; Attout A.; Giovanella U.; Scavia G.; Tubino R.; Botta C.; Bolognesi A. (2009)
    Bifunctional microstructured films and surfaces obtained by soft lithography from breath figure arrays
    in Soft matter (Print)
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Vohra V.; Yunus A.; Attout A.; Giovanella U.; Scavia G.; Tubino R.; Botta C.; Bolognesi A. (literal)
Pagina inizio
  • 1656 (literal)
Pagina fine
  • 1661 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
  • http://pubs.rsc.org/en/Content/ArticleLanding/2009/SM/b819811j (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 5 (literal)
Rivista
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroFascicolo
  • 8 (literal)
Note
  • Scopu (literal)
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • Vohra V., Giovanella U., Scavia G., Bolognesi A. Botta C., Istituto per lo Studio delle Macromolecole (ISMac-CNR), Via Bassini, 15, 20133 Milano, Italy e Polo Scientifico Tecnologico, CNR Via Fantoli 16, 20133 Milano, Italy Yunus A., Attout A., Laboratoire de Physico-Chimie et Physique des Mat_eriaux, Place Croix du Sud, 1, 1348 Louvain-la-Neuve, Belgium. E-mail: sami.yunus@ uclouvain.be Tubino R., Universita di Milano-Bicocca/Dipartimento Scienza dei Materiali, Via Roberto Cozzi 53, 20125 Milano, Italy (literal)
Titolo
  • Bifunctional microstructured films and surfaces obtained by soft lithography from breath figure arrays (literal)
Abstract
  • Breath figure films of polystyrene and polyalkylthiophene presenting regular patterns of 600 nm and 5 mm are used as templates to prepare negative polydimethylsiloxane stamps containing an entrapped quantity of the primary polymer. These breath figure replica are used to generate single or double layers of the entrapped conjugated polymer in the form of networks on any substrates. Besides this, polystyrene printed in this way can be used as a resist mask that allows the polymerization of aniline in a regular micrometric arrangement on a platinum electrode or to generate a regular acid/base patterning on a plain polyaniline film (literal)
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