http://www.cnr.it/ontology/cnr/individuo/prodotto/ID54319
Characterization of poly(3-methylthiophene)-like films produced by Plasma Polymerization (Articolo in rivista)
- Type
- Label
- Characterization of poly(3-methylthiophene)-like films produced by Plasma Polymerization (Articolo in rivista) (literal)
- Anno
- 2007-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1002/ppap.200731909 (literal)
- Alternative label
Vassallo E., La Guardia L., Catellani M., Cremona A., Dell'Era F., Ghezzi F. (2007)
Characterization of poly(3-methylthiophene)-like films produced by Plasma Polymerization
in Plasma processes and polymers (Print); Wiley-VCH Verlag Gmbh, Weinheim (Germania)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Vassallo E., La Guardia L., Catellani M., Cremona A., Dell'Era F., Ghezzi F. (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#url
- http://onlinelibrary.wiley.com/doi/10.1002/ppap.200731909/abstract (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Istituto di Fisica del Plasma, CNR; Istituto per lo Studio delle Macromolecole, CNR (literal)
- Titolo
- Characterization of poly(3-methylthiophene)-like films produced by Plasma Polymerization (literal)
- Abstract
- Polymers are widely used in a great number of applications because of their many advantages. For applications requiring optical and conductive properties, the choice of a suitable polymer is limited to polymers with a conjugated chemical structure such as polyacetylene, polypyrrole, and polythiophene. Very thin film of polythiophene can be deposited by electrochemical procedures and plasma polymerization. A plasma consists of a variety of reactive species (electrons, ions, radicals, etc.) and therefore many different reactions can occur. The aim of this study is to produce poly(3-methylthiophene) using the plasma technology in pulsed wave. The influence of RF power on the film properties will be evaluated. (literal)
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- Autore CNR
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