Fabrication of material patterns by grid-assisted deposition (Articolo in rivista)

Type
Label
  • Fabrication of material patterns by grid-assisted deposition (Articolo in rivista) (literal)
Anno
  • 2003-01-01T00:00:00+01:00 (literal)
Alternative label
  • Massimiliano Massi 1, Massimiliano Cavallini 2, Stefano Stagni 3, Antonio Palazzi 4 and Fabio Biscarini 5 (2003)
    Fabrication of material patterns by grid-assisted deposition
    (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
  • Massimiliano Massi 1, Massimiliano Cavallini 2, Stefano Stagni 3, Antonio Palazzi 4 and Fabio Biscarini 5 (literal)
Pagina inizio
  • 923 (literal)
Pagina fine
  • 925 (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
  • 23 (literal)
Note
  • ISI Web of Science (WOS) (literal)
Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
  • 1,2,5 -CNR-ISMN, Bologna, Italy 3,4 - Dip. di Chimica Fisica ed Inorganica, Facoltà di Chimica Industriale, Bologna, Italy (literal)
Titolo
  • Fabrication of material patterns by grid-assisted deposition (literal)
Abstract
  • We developed a simple patterning approach where a grid with micrometer rule is used in order to control the deposition of a solute. Ordered patterns were obtained, over large areas, in a few seconds. The patterning process we propose here is fast and low cost. It can also be applied to diverse soluble molecular and supramolecular species. We also investigated what parameters have to be changed in order to have total control on the final tridimensional architecture of the material. (literal)
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