Direct patterning of tris-(8-hydroxyquinoline)-aluminum (III) thin film at submicron scale by modified micro-transfer molding (Articolo in rivista)

Type

• Prodotto della ricerca (Classe)
• Articolo in rivista (Classe)

Label

• Direct patterning of tris-(8-hydroxyquinoline)-aluminum (III) thin film at submicron scale by modified micro-transfer molding (Articolo in rivista) (literal)

Anno

• 2002-01-01T00:00:00+01:00 (literal)

Alternative label

• Cavallini, M. 1, Murgia, M. 2, Biscarini, F. 3 (2002)
  Direct patterning of tris-(8-hydroxyquinoline)-aluminum (III) thin film at submicron scale by modified micro-transfer molding
  
  (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori

• Cavallini, M. 1, Murgia, M. 2, Biscarini, F. 3 (literal)

Pagina inizio

• 275 (literal)

Pagina fine

• 278 (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume

• 19 (literal)

Note

• ISI Web of Science (WOS) (literal)

Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni

• 1,2,3 - CNR-ISMN-Bologna, Italy (literal)

Titolo

• Direct patterning of tris-(8-hydroxyquinoline)-aluminum (III) thin film at submicron scale by modified micro-transfer molding (literal)

Abstract

• Tris-(8-hydroxyquinoline)-aluminum (III) (AlQ3) is one of the most widely used materials for its high luminescence efficiency in organic light-emitting devices. We propose the fabrication at submicron resolution of a patterned thin film of AlQ3 on a SiO/Si surface by modified micro-transfer molding. The process is made in one step and takes a few minutes. The film is formed during the transfer process, it is continuous and does not exhibit signs of stress or rupture. After applying a drop of AlQ3 solution to the surface of the mold, we placed it on the surface of the sample without removing the excess ink. The film is formed during the printing process. In this manner, it is possible to obtain a patterned homogeneous film with nanometer-size features in a single step, with no change in its adhesion and mechanical properties. Since there is not any specificity between the mold and AlQ3, we suggest that our procedure may be of general use for conjugated materials. (literal)

Prodotto di

• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)

Autore CNR

• MASSIMILIANO CAVALLINI (Unità di personale interno)
• MAURO MURGIA (Persona)
• FABIO BISCARINI (Unità di personale interno)

Insieme di parole chiave

• Parole chiave di "Direct patterning of tris-(8-hydroxyquinoline)-aluminum (III) thin film at submicron scale by modified micro-transfer molding" (Insieme di parole chiave)

Incoming links:

Autore CNR di

• MASSIMILIANO CAVALLINI (Unità di personale interno)
• MAURO MURGIA (Persona)
• FABIO BISCARINI (Unità di personale interno)

Prodotto

• Istituto per lo studio dei materiali nanostrutturati (ISMN) (Istituto)

Insieme di parole chiave di

• Parole chiave di "Direct patterning of tris-(8-hydroxyquinoline)-aluminum (III) thin film at submicron scale by modified micro-transfer molding" (Insieme di parole chiave)