http://www.cnr.it/ontology/cnr/individuo/prodotto/ID52398
Superhard Tungsten Tetraboride Films Prepared by Pulsed Laser Deposition Method (Articolo in rivista)
- Type
- Label
- Superhard Tungsten Tetraboride Films Prepared by Pulsed Laser Deposition Method (Articolo in rivista) (literal)
- Anno
- 2011-01-01T00:00:00+01:00 (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#doi
- 10.1021/am200927q (literal)
- Alternative label
Rau J.V., Latini A., Teghil R., De Bonis A., Fosca M., Caminiti R., Rossi Albertini V. (2011)
Superhard Tungsten Tetraboride Films Prepared by Pulsed Laser Deposition Method
in ACS applied materials & interfaces (Print); ACS, American chemical society, Washington, DC (Stati Uniti d'America)
(literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#autori
- Rau J.V., Latini A., Teghil R., De Bonis A., Fosca M., Caminiti R., Rossi Albertini V. (literal)
- Pagina inizio
- Pagina fine
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#numeroVolume
- Rivista
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#note
- http://dx.doi.org/10.1021/am200927q (literal)
- Note
- ISI Web of Science (WOS) (literal)
- Http://www.cnr.it/ontology/cnr/pubblicazioni.owl#affiliazioni
- Istituto di Struttura della Materia, Consiglio Nazionale delle Ricerche (CNR), Via del Fosso del Cavaliere, 100-00133, Rome, Italy
Università di Roma La Sapienza, Dipartimento di Chimica, Piazzale Aldo Moro, 5-00185 Rome, Italy
Università della Basilicata, Dipartimento di Chimica A.M. Tamburro, Via dellAteneo Lucano 10-85100 Potenza, Italy; CNR-IMIP UOS di Potenza, Zona Industriale di Tito scalo (PZ), Italy (literal)
- Titolo
- Superhard Tungsten Tetraboride Films Prepared by Pulsed Laser Deposition Method (literal)
- Abstract
- Attempts to synthesize and/or theoretically predict new superhard materials are the subject of an intense research activity. The trials to deposit them in the form of films have just began. WB2 (77 wt % WB2 and 23 wt % WB4) and WB4 (65 wt % WB4 and 35 wt % WB2) polycrystalline bulk samples were obtained in this work via electron beam synthesis technique and, subsequently, used as targets for films preparation by the pulsed laser deposition method. The targets were irradiated by a frequency-doubled Nd:glass laser with a pulse duration of 250 fs. The films grown on SiO2 substrates at 600 °C were characterized by X-ray diffraction, scanning electron and atomic force microscopies, and Vickers microhardness technique. The deposited films are composed of WB4. The intrinsic film hardness, calculated according to the law-of-mixtures model, lies in the superhardness region 4250 GPa. (literal)
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